Difference between revisions of "Lab 18-2"

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Revision as of 21:21, 24 August 2015


Lab 18-2
61081.jpg
Equipment Details
Technology PVD
Materials Restriction Metals
Material Processed Al,Cr,Cu,Au,Ge,Ir,Ni,NiCr,Pt,Si,Ag,Ti
Sample Size 150mm x 4mm and smaller samples
Gases Used Ar, N2, O2
Equipment Manual


Lab 18-2 is a magnetron sputter deposition tool for depositing conductive metallic films. Sputter deposition is achieved by bombarding a source material with energetic ions, typically Ar+. Atoms at the surface of the target are knocked loose, and transported to the surface of the substrate, where deposition occurs. Electrically conductive material such as Al, W, and Ti can use a dc power source, in which the target acts as the cathode in a diode system. Sputtering of dielectrics such as silicon dioxide, or aluminum oxide requires an Rf power source to supply energy to the argon atoms. Sputter films are ideal for sidewall coverage in low thermal budget cases for contact and insulating layers over features.

Announcements

  • Update this with announcements as necessary

Capabilities

  • Computer controlled recipes
  • Load lock supported processing
  • limited film stress versatility with in film development.
  • Reactive Film capabilities (Ar, O2, and N2)

System Overview

The Lab 18-2 has a 18" D-shaped chamber with a load lock chamber to quickly load and unload samples without breaking high vacuum in the process chamber. The tools five magnetron sputtering sources are set up to allow for RF, DC, and DC co-sputtering. There is an additional Rf power supply on the substrate platen to allow for in situ sample cleans, and bias voltage to manipulate the film characteristics. Sample heating up to 500C is achieved by using the tools quartz heater lamps.

Hardware Details

  • Cryo pumped chamber – upper 10-7 base pressure
  • Chamber capacity: single wafer
  • Configured with load lock
  • Sample heating – up to 500°C
  • Power specs
    • Five 3” Sputtering Guns
    • 2 DC and 2 RF power supply (one for sample bias)

Substrate Requirements

  • Sample sizes: pieces, up to 6” wafers.
  • Wafer holders available for 2", 3", 4", 6"; as well as clip fixtures for smaller pieces
    • Diameter 150mm maximum
    • Substrates up to 4mm Thick. With special fixture up to 8mm.

Material Restrictions

The Lab 18-2 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

Basic "User" access with the Lab 18's provide researchers the ability to load, transfer samples, and deposit standard characterized materials. For more details, see Lab 18-2/Processes.

In addition to these, this tool has a number of user-supported recipes for depositing a wide variety of materials. Some of these recipes are documented on [Lab 18-2 User Processes]. If you are curious if your material can be deposited in this tool, please contact the tool engineers via the helpdesk ticket system.

Process Name

Fourteen films are available. If two thicknesses are listed the first is for per run and the second thickness is for total material used per reservation.

Material Max thickness (Run/Reservation)
Aluminum (Al) 1 µm / NA
Alumina/Aluminum Oxide (Al2O3) 1000Å / NA
Chrome (Cr) 2000Å / NA
Copper (Cu) 1000Å / 5000Å
Germanium (Ge) 4000 Å / NA
Gold (Au) 5000Å / NA
Iron (Ir) 1000Å / 5000Å
Nickel (Ni) 5000 Å / 1 µm
Molybdenum (Mo) 2000 Å / 8000 Å
Platinum (Pt) 5000 Å / 1 µm
Silver (Ag) 5000 Å / 1 µm
Tantalum (Ta) 2000 Å / NA
Titanium (Ti) 2000 Å / 5000 Å
Tungsten (W) 3000 Å / 9000 Å
Tungsten/Titanium (W-Ti) 3000 Å / 8000 Å

Standard Operating Procedure

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Checkout Procedure

The Lab 18-2 is on the LNF Scheduler. LNF constituents may reserve time on the tool, and even request staff support for process development. For more details, see Lab 18 access and training.


Maintenance

For more details, see Lab 18-2/Maintenance and qualification.