Difference between revisions of "Laurell Spinner"
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===Hardware details=== | ===Hardware details=== | ||
* This tool is exhausted | * This tool is exhausted | ||
| − | * There are different chucks for wafers (100 mm and 150 mm use same chuck), glass | + | * There are different chucks for wafers (100 mm and 150 mm use same chuck), glass slides and pieces |
* The spinner door must be closed and vacuum must be on to operate the tool | * The spinner door must be closed and vacuum must be on to operate the tool | ||
* Users MUST clean the bowl and lid throroughly after each use | * Users MUST clean the bowl and lid throroughly after each use | ||
Revision as of 16:13, 4 October 2021
| Laurell Spinner | |
|---|---|
 Laurell Spinner Ws-650-23B | |
| Equipment Details | |
| Technology | Lithography |
| Materials Restriction | Metals |
| Chemicals Used | Photoresist, Polyimides, PDMS, other with approval |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | SU-8 2100, 2050, 2005, 2010, Polyimide 2610 and 2611 |
| User Processes | User Processes |
| Maintenance | Maintenance |
 Warning: | This page has not been released yet. |
The Laurell Spinner Laurell spinner is located in the ROBIN lab. A great variety of materials, that are not allowed to be spun in the clean room, can be spun here. This new tool replaces the old Solitec spinner and it is, as always, associated with the Solvent 94 bench. In order to reserve this tool users must reserve Solvent 94 bench. The main uses of this spinner are for soft lithography, polyimide processing and surface protection for dicing. There are just a few photoresist available for this tool, but users can bring private photoresist, or other spinnable materials provided they are approved.
Contents
Announcements
- Aluminum foil on the lid helps with the cleaning. If users do not want to use it is fine, as long as the tool is throoughly claned after use
- When spinning a thin phtoresist we recommend to remove the aluminum foil or puddles formed during spinning will empty when opening the lid and ruin the sample
- Users spinning Polyimide must be extra careful and make sure spinner is clean after use. Polyimide dries up and forms flakes that will deposit ruin the freshly spun film.
Capabilities
- Can spin 100 mm, 150 mm, glass slides and pieces
- wafer aligner tool
Chemicals Spinned in this Bench
- SU-8
- Polyimide
- PDMS
- Photoresist for dicing protection
System overview
Hardware details
- This tool is exhausted
- There are different chucks for wafers (100 mm and 150 mm use same chuck), glass slides and pieces
- The spinner door must be closed and vacuum must be on to operate the tool
- Users MUST clean the bowl and lid throroughly after each use
Substrate requirements
- Wafer Size
- Wafer type
- Any mounting?
- Wafer thickness
Material restrictions
When spinning a material not listed above, contact tool engineer.
Supported processes
There are several processes for this tool supported by the LNF, which are described in more detail on the Processes page.
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on Laurell Spinner user processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
Standard operating procedure
Widget text will go here.
Checkout procedure
- Read through this page and the Standard Operating Procedure above.
- Complete the training request form here.
- Create a Helpdesk Ticket requesting training.
- A tool engineer will schedule a time for initial training.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Complete the SOP quiz here.
- Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
Maintenance
Process name
