View source for Lift-off

{{Infobox technology
|image = Liftoff-cartoon.jpg
|technology = Lift-off
|names = 
|equipment = [[Solvent Bench 14]],[[Solvent Bench 84]], [[Solvent Bench 83]]
}}<!-- Make sure to categorize page as "Equipment" and its subcategory -->

[[{{PAGENAME}}]] is a method of patterning a target material (typical a metal) using a sacrificial layer (typically photoresist) to define the pattern. First, the sacrificial layer is applied and patterned; then the target material is deposited on top. The final step is the removal of the sacrificial material which lifts off the overlying target material. 

The main benefit of lift-off is the ability to pattern a wide variety of materials, especially inert and hard to etch metals. It also avoids damage and compatibility issues that can arise with etching. The limitations include difficult lift-off in the spacing between lines, edge effects, and redeposition of material onto the sample. All of these can be mitigated with proper preparation and processing.