Difference between revisions of "Lithography training session"

From LNF Wiki
Jump to navigation Jump to search
Line 1: Line 1:
This is a brief, group overview training session on lithography processing to inform users of the process steps involved and tools and techniques available. The training session is required for certain tool checkouts, including the [[CEE 100CB photoresist spinner]], [[CEE Developer 1]], [[CEE Developer 2]], [[CEE 200X photoresist spinner 1]], [[CEE 200X photoresist spinner 2]], and the [[Image Reversal Oven]]. You only need to take this training session once along with completing the other requirements listed in checkout sections their respective wiki pages for access to these tools. This training is best taken after you have had some exposure to the lithographic process. This can be at another facility, through a class you have taken, or in learning to process with your mentor.
+
Covid 19 update. This training is changing. Stay tuned. Link s to new training will be provided soon.
  
==Signup==
+
This is a an overview training on lithography processing. The goal is to inform users of the process steps involved, tools, and techniques available at the LNF. The training is required for Lithography tool checkouts. These include the [[CEE 100CB photoresist spinner]], [[CEE Developer 1]], [[CEE Developer 2]], [[CEE 200X photoresist spinner 1]], [[CEE 200X photoresist spinner 2]], [[Image Reversal Oven]], [[GCA AS200 AutoStep]], [[MA/BA-6 Mask/Bond Aligner]], [[MA6 Mask Aligner]], [[MJB3-2]], MJB 45S]]. You only need to take this training session once along with completing the other requirements listed in checkout sections their respective wiki pages for access to these tools.  
Please fill out the following form to request training, and a staff member will get back to you with a scheduled timeThis is a group training session so please indicate all times that you are available.
 
  
[https://docs.google.com/a/lnf.umich.edu/forms/d/15SWgO7oY4iSkAtjkIj-RO8DDpIjirmOqL7tv66-gpnA/viewform?formkey=dDdBbXNBLVBUdTM5NXRXSllhaHQyNUE6MQ#gid=0 Lithography Training Session Signup]
 
 
==Quiz==
 
After completing the training session, please complete this quiz.
 
 
[https://docs.google.com/a/lnf.umich.edu/spreadsheet/viewform?formkey=dC1RVktIRlRFSlI0NGFWNGJQZnpuMkE6MQ#gid=0 Lithography Quiz]
 
  
 
==Overview==
 
==Overview==

Revision as of 08:32, 25 August 2020

Covid 19 update. This training is changing. Stay tuned. Link s to new training will be provided soon.

This is a an overview training on lithography processing. The goal is to inform users of the process steps involved, tools, and techniques available at the LNF. The training is required for Lithography tool checkouts. These include the CEE 100CB photoresist spinner, CEE Developer 1, CEE Developer 2, CEE 200X photoresist spinner 1, CEE 200X photoresist spinner 2, Image Reversal Oven, GCA AS200 AutoStep, MA/BA-6 Mask/Bond Aligner, MA6 Mask Aligner, MJB3-2, MJB 45S][MJB3-2]]. You only need to take this training session once along with completing the other requirements listed in checkout sections their respective wiki pages for access to these tools.


Overview

Widget text will go here.

See also