Difference between revisions of "Lithography training session"
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This is a brief training session on lithography processing to inform users of the process steps involved and tools and techniques available. The training session is required for certain tool checkouts, including the [[CEE 100CB photoresist spinner]], [[CEE Developer 1]], [[CEE Developer 2]], [[CEE 200X PR Spinner 1]], [[CEE 200X PR Spinner 2]], and the [[Image Reversal Oven]]. Only one training session is necessary for access to these tools. | This is a brief training session on lithography processing to inform users of the process steps involved and tools and techniques available. The training session is required for certain tool checkouts, including the [[CEE 100CB photoresist spinner]], [[CEE Developer 1]], [[CEE Developer 2]], [[CEE 200X PR Spinner 1]], [[CEE 200X PR Spinner 2]], and the [[Image Reversal Oven]]. Only one training session is necessary for access to these tools. | ||
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==See also== | ==See also== | ||
* [[Optical lithography]] | * [[Optical lithography]] | ||
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| + | [[Category:Optical lithography]] | ||
Revision as of 17:41, 17 August 2015
This is a brief training session on lithography processing to inform users of the process steps involved and tools and techniques available. The training session is required for certain tool checkouts, including the CEE 100CB photoresist spinner, CEE Developer 1, CEE Developer 2, CEE 200X PR Spinner 1, CEE 200X PR Spinner 2, and the Image Reversal Oven. Only one training session is necessary for access to these tools.
Contents
Signup
Please fill out the following form to request training, and a staff member will get back to you with a scheduled time. This is a group training session so please indicate all times that you are available.
Lithography Training Session Signup
Quiz
After completing the training session, please complete this quiz.
Overview
Widget text will go here.
