Difference between revisions of "MA-BA-6 Mask-Bond Aligner"

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===Substrate Requirements===
 
===Substrate Requirements===
* full 4" and 6" wafers standardPieces possible with tool engineer approval
+
* Full 4" and 6" wafers standard
 +
** Pieces possible with tool engineer approval
 
* Mounting may be necessary if wafer has thru holes, etc.  Create helpdesk ticket for assistance
 
* Mounting may be necessary if wafer has thru holes, etc.  Create helpdesk ticket for assistance
 
* Wafer thickness up to 3 or 4mm
 
* Wafer thickness up to 3 or 4mm

Revision as of 09:47, 15 May 2015



MA-BA-6 Mask-Bond Aligner
50020.jpg
Equipment Details
Technology Contact Lithography
Materials Restriction Semi-Clean
Mask Materials 4", 5", 7"
Sample Size 4" and 6" wafers. Pieces with staff approval
Chemicals Used lnf approved photoresists
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
Maintenance Maintenance


Warning Warning: This page has not been released yet.

This tool is primarily used to expose photo-definable materials. We allow 4” masks, 5” masks, 7” masks, transparencies, shadow masking, or just flood exposure. The tooling can also be changed out to provide wafer to wafer alignment for wafers that need to be aligned before bonding in the SB-6E Bonder.

Capabilities

  • 1-2 µm min feature size resolution in thin resist
  • Aspect Ratio 1:3 fairly standard
  • Substrate thickness 200 µm to 4 mm possible

System Overview

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Hardware Details

  • Broadband light source calibrated to 20mJ/sec at the 405nm peak. Total broadband dose about 30mJ/sec
  • 4" and 6" chucks
    • Backside alignment piece chuck available with staff permission.
  • 4", 5" and 7" mask holders
  • Flood exposure, soft, hard, and vacuum contact capable
  • Capable of topside, backside and wafer to wafer alignment
  • 10mm stage travel, 150mm microscope objective travel with split field view camera option

Substrate Requirements

  • Full 4" and 6" wafers standard
    • Pieces possible with tool engineer approval
  • Mounting may be necessary if wafer has thru holes, etc. Create helpdesk ticket for assistance
  • Wafer thickness up to 3 or 4mm

Material Restrictions

The MA-BA-6 Mask-Bond Aligner is designated as a Semi-Clean class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

Exposure of all LNF approved photoresists are allowed on this tool in accordance with standard operating procedure.

If you are curious if your material can be processed in this tool, or you wish to find out if a non standard process will be allowed, please contact the tool engineers via the helpdesk ticket system.

Standard Operating Procedure

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Checkout Procedure

  1. Read through this page and the Standard Operating Procedure above.
  2. Complete the training request form here.
  3. Create a Helpdesk Ticket requesting training.
  4. A tool engineer will schedule a time for initial training.
  5. Practice with your mentor or another authorized user until you are comfortable with tool operation.
  6. Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.

Maintenance

Process Name