Difference between revisions of "MA-BA-6 Mask-Bond Aligner"

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==System overview==
 
==System overview==
{{#widget:GoogleDoc|key=1lv9Fn5spwDrptJDpjkIkggPPx6GujKKS-S9dmdsItRw}}
 
 
===Hardware Details===
 
===Hardware Details===
* Broadband light source calibrated to 20 mJ/sec at the 405 nm peak.  Total broadband dose about 30 mJ/sec
+
* Broadband light source calibrated to 20 mJ/sec at the 405 nm peak.  Total broadband dose ~30 mJ/sec
 
* 4" and 6" chucks
 
* 4" and 6" chucks
 
** Backside alignment piece chuck available with staff permission.
 
** Backside alignment piece chuck available with staff permission.
 
* 4", 5" and 7" mask holders
 
* 4", 5" and 7" mask holders
* Flood exposure, soft, hard, and vacuum contact capable (for details, see SOP)
+
* Flood exposure, soft, hard, and vacuum contact capable
 
* Capable of topside, backside and wafer to wafer alignment
 
* Capable of topside, backside and wafer to wafer alignment
 
* 10 mm stage travel, 150 mm microscope objective travel with split field view camera option
 
* 10 mm stage travel, 150 mm microscope objective travel with split field view camera option
  
 
===Substrate requirements===
 
===Substrate requirements===
* Full 4" and 6" wafers standard
+
* Full 4" and 6" wafers standard (pieces should use the [[MJB3-2|MJB3]] with a 4" mask)
** Pieces possible with tool engineer approval
 
 
* Mounting may be necessary if wafer has thru holes, etc.  Create helpdesk ticket for assistance
 
* Mounting may be necessary if wafer has thru holes, etc.  Create helpdesk ticket for assistance
 
* Substrate thickness 200 µm to 4 mm possible
 
* Substrate thickness 200 µm to 4 mm possible
  
 
===Material restrictions===
 
===Material restrictions===
{{material restrictions}}
+
Allowed Materials - LNF approved photoresists
 +
 
 +
Not Allowed Materials - Uncured PDMS and SU-8 (restricted w/out approval)
  
 
==Supported processes==  
 
==Supported processes==  

Revision as of 12:44, 3 November 2017

MA-BA-6 Mask-Bond Aligner
50020.jpg
Equipment Details
Technology Contact lithography
Materials Restriction Semi-Clean
Material Processed Photoresist
Mask Materials 4", 5", 7" mask plates
Sample Size 4" and 6" wafers. Pieces with staff approval
Chemicals Used LNF approved photoresists
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
Maintenance Maintenance


This tool is primarily used to expose photo-definable materials. We allow 4” masks, 5” masks, 7” masks, transparencies, shadow masking, or just flood exposure. This tool is capable of backside alignment. The tooling can also be changed out to provide wafer to wafer alignment for wafers that need to be aligned before bonding in the SB-6E Bonder.

Capabilities

  • 2 µm min feature size resolution in thin resist
  • Aspect Ratio 1:3 fairly standard
  • Substrate thickness 200 µm to 4 mm possible
  • Capable of back side alignment

System overview

Hardware Details

  • Broadband light source calibrated to 20 mJ/sec at the 405 nm peak. Total broadband dose ~30 mJ/sec
  • 4" and 6" chucks
    • Backside alignment piece chuck available with staff permission.
  • 4", 5" and 7" mask holders
  • Flood exposure, soft, hard, and vacuum contact capable
  • Capable of topside, backside and wafer to wafer alignment
  • 10 mm stage travel, 150 mm microscope objective travel with split field view camera option

Substrate requirements

  • Full 4" and 6" wafers standard (pieces should use the MJB3 with a 4" mask)
  • Mounting may be necessary if wafer has thru holes, etc. Create helpdesk ticket for assistance
  • Substrate thickness 200 µm to 4 mm possible

Material restrictions

Allowed Materials - LNF approved photoresists

Not Allowed Materials - Uncured PDMS and SU-8 (restricted w/out approval)

Supported processes

This tool is primarily used to expose photodefinable materials. The lamp output is calibrated to the 405 nm peak at 20 mJ/sec with 3% uniformity across the 4” area. The 365 peak output is about half of this and tracks very well however is not routinely calibrated. We allow 4” masks, 5” masks, 7” masks, transparencies, shadow masking, or just flood exposure. The tooling can also be changed out to provide wafer to wafer alignment for wafers that need to be aligned before bonding in the SB6-E.

Exposure of all LNF approved photoresists are allowed on this tool in accordance with standard operating procedure. More data on exposure times can be found on datasheet for the specific photoresist.

Standard operating procedure

Checkout procedure

  1. Read through the Standard Operating Procedure.
  2. Complete the SOP quiz
  3. Create a Helpdesk Ticket requesting training.
  4. A tool engineer will schedule a time for initial training.
  5. Practice with your mentor or another authorized user until you are comfortable with tool operation.
  6. Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.

Maintenance

The UV energy at the chuck face is routinely calibrated, so that the energy delivered corresponds to the display on the lamp controller. The energy delivered is 20 mJ/sec at the 405 nm wavelength with an additional 9-10 mJ/sec at the 365 nm wavelength (the 365 nm peak is not calibrated, but is constant in relation to the 405 nm peak). Lamp uniformity is routinely calibrated to within 2-3% across the 150 mm range. The WEC (Wedge Error Compensation) head is completely rebuilt semi annually and checked monthly and adjusted as needed for level.