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 | This article is missing information about details of types of contact, pressure settings, etc. |
This tool is primarily used to expose photo-definable materials. We allow 4” masks, 5” masks, 7” masks, transparencies, shadow masking, or just flood exposure. The tooling can also be changed out to provide wafer to wafer alignment for wafers that need to be aligned before bonding in the SB-6E Bonder.
| MA-BA-6 Mask-Bond Aligner | |
|---|---|
 | |
| Equipment Details | |
| Technology | Contact lithography |
| Materials Restriction | Semi-Clean |
| Mask Materials | 4", 5", 7" |
| Sample Size | 4" and 6" wafers. Pieces with staff approval |
| Chemicals Used | LNF approved photoresists |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | Supported Processes |
| Maintenance | Maintenance |
 Warning: | This page has not been released yet. |
Contents
Capabilities
- 1-2 µm min feature size resolution in thin resist
- Aspect Ratio 1:3 fairly standard
- Substrate thickness 200 µm to 4 mm possible
- Capable of back side alignment
System Overview
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Hardware Details
- Broadband light source calibrated to 20mJ/sec at the 405nm peak. Total broadband dose about 30mJ/sec
- 4" and 6" chucks
- Backside alignment piece chuck available with staff permission.
- 4", 5" and 7" mask holders
- Flood exposure, soft, hard, and vacuum contact capable (for details, see SOP)
- Capable of topside, backside and wafer to wafer alignment
- 10mm stage travel, 150mm microscope objective travel with split field view camera option
Substrate Requirements
- Full 4" and 6" wafers standard
- Pieces possible with tool engineer approval
- Mounting may be necessary if wafer has thru holes, etc. Create helpdesk ticket for assistance
- Substrate thickness 200 µm to 4 mm possible
Material Restrictions
The MA-BA-6 Mask-Bond Aligner is designated as a Semi-Clean class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Supported Processes
Exposure of all LNF approved photoresists are allowed on this tool in accordance with standard operating procedure. More data on photoresist exposure times can be found on the supported processes page MA-BA-6_Mask-Bond_Aligner/Processes.
Standard Operating Procedure
 | This article 's SOP does not follow the LNF Equipment Manual Guidelines. |
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Checkout Procedure
- Read through this page and the Standard Operating Procedure above.
- Create a Helpdesk Ticket requesting training.
- A tool engineer will schedule a time for initial training.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
Maintenance
| | This section requires expansion with: lamp dosage, maybe WEC rebuilds. |
The UV energy at the chuck face is routinely calibrated, so that the energy delivered corresponds to the display on the lamp controller. The energy delivered is 20 mJ/sec at the 405nm wavelength with an additional 9-10 mJ/sec at the 365nm wavelength (the 365nm peak is not calibrated, but is constant in relation to the 405nm peak). Lamp uniformity is routinely calibrated to within 2-3 % across the 150 mm range. The WEC (Wedge Error Compensation) head is completely rebuilt semi annually and checked monthly and adjusted as needed for level.