View source for MJB3-2

{{#vardefine:toolid|50041}} {{#vardefine:technology|Contact lithography}} {{#vardefine:restriction|4}}
{{infobox equipment
|caption = 
|materials = LNF approved [[photoresist]]s
|mask = 4" masks (smaller possible with tool engineer discussion)
|size = small pieces up to 3" diameter
|chemicals =
|gases = 
|overview = [[{{PAGENAME}}#System_overview | System Overview]]
|sop = [https://docs.google.com/document/d/1fhmJ5T8mw2RLVgUgm0u2W7FXRHD73Srh/edit?usp=sharing&ouid=109740028282576410484&rtpof=true&sd=true SOP]
|processes = [[{{PAGENAME}}/Processes|Supported Processes]]
|userprocesses = [[LNF_User:{{PAGENAME}}_user_processes|User Processes]]
|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
}}

The [[{{PAGENAME}}]] is primarily used to expose [[Photoresist|photo-definable]] materials on small pieces up to 3" in diameter. It only accepts 4” hard masks or smaller. Transparencies, shadow masks, or flood exposure can also be used.