Mask Bench 13

Mask Bench 13
Equipment Details
Technology	Wet bench
Materials Restriction	Metals
Chemicals Used	Chromium Etch Nanostrip
Equipment Manual
Overview	System Overview
Supported Processes	Supported Processes
User Processes	User Processes
Maintenance	Maintenance

Mask Bench 13 is a wet bench that is set up for wet etching and cleaning masks. There is a tank of chromium etch and a tank of Nanostrip for photoresist removal.

Capabilities

Mask Bench 13 has a static tank with Chromium Etch for etching masks and a heated tank of Nanostrip for photoresist removal.

System overview

Chemicals Allowed

• Chromium Etch
• Nanostrip

Hardware details

• Static Chromium Etch Tank
• Heated Nanostrip Tank
• Quick dump rinse (QDR)
• Automatic bottle wash
• Sink with gooseneck faucet

Safety

Proper PPE for this bench are apron, face shield, trionic gloves and safety glasses

Warning:

You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.

Working with chemicals can be very dangerous. To minimize the chance of accident, make sure you always:

• Wear personal protective equipment. Required PPE at this bench is an apron, face shield, and Trionic gloves.
• LNF Glove Policy
• Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
• Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
• Do not use this bench without proper training.

• Waste from this bench goes into the LNF’s acid waste neutralization system and then to city sewers.
  • No solvents can be used or disposed of here.
  • Solutions which contains toxic materials that cannot be removed by neutralization (such as gold and chromium etch) should not be aspirated or disposed of down the drain.

Substrate requirements

• 4x4 masks
• 5X5 masks
• 7X7 masks

Material restrictions

The Mask Bench 13 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.

Approved materials

Standard operating procedure

For a detailed version of the SOP, see below Widget text will go here.

Checkout procedure

Checkout on Mask Bench 13 requires the following steps:

1. Take the General Wet Bench Training, if you haven't already.
2. Read through this page and the Standard Operating Procedure above.
3. Complete the Mask Bench Training Quiz.
4. Practice with your mentor or another authorized user until you are comfortable with tool operation.
   1. If your mentor is not an authorized user or you do not know of an authorized user that can train you, proceed to the next step.
5. Create a helpdesk ticket for final confirmation of your checkout appointment.
6. If you pass the quiz the tool engineer will authorize you on the tool.

Maintenance

• Nano-strip Tank Change
• The nanostrip tank is changed by staff weekly on Mondays at 9:30 AM
• The Chromium etch tank is changed by staff every 6 weeks