Difference between revisions of "Nanoquest II Ion Mill"
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==Supported processes== | ==Supported processes== | ||
| − | + | {{main|{{PAGENAME}}/Processes}} | |
| − | + | Initial characterization data for several recipes provided by the vendor are shown in the table below. Data is for thermal oxide and SPR 220. Uniformity data is from the thermal oxide measurement on 150 mm wafers with 10 mm edge exclusion. | |
| − | <!-- If you allow custom recipes, let users know to contact a tool engineer, and you may also create the link below which will create a page that users can add custom recipes to. | + | {|class="wikitable sortable" style="text-align:center" |
| − | In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|{{BASEPAGENAME}} user processes]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system. | + | |- |
| + | ! Recipe Name !! Oxide Etch Rate<br/>(nm/min) !! SPR 220 Etch Rate<br/>(nm/min) !! Uniformity<br/>(10 mm EE) | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_200VB_165IB_40VA || 3.4 || 1.8 || 4.1% | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_300VB_320IB_60VA || 8.9 || || 4.5% | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_400VB_510IB_80VA || 16.6 || 14.2 || 3.9% | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_500VB_740IB_100VA || 27.2 || 21.7 || 4.9% | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_600VB_500IB_120VA || 23.2 || 18.6 || 1.5% | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_600VB_990IB_120VA || 40.2 || 35.1 || 3.1% | ||
| + | |- | ||
| + | | style="text-align:left" | LNF_800VB_500IB_160VA || style="color: red;" | 25.4 || || 3.9% | ||
| + | |} | ||
| + | |||
| + | <!-- If you allow custom recipes, let users know to contact a tool engineer, and you may also create the link below which will create a page that users can add custom recipes to. | ||
| + | In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|{{BASEPAGENAME}} user processes]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.--> | ||
==Standard operating procedure== | ==Standard operating procedure== | ||
Revision as of 11:51, 10 March 2020
| Nanoquest II Ion Mill | |
|---|---|
| Equipment Details | |
| Manufacturer | Intlvac Thin Film |
| Model | Nanoquest II |
| Technology | Ion milling |
| Materials Restriction | Metals |
| Sample Size | 100 mm, 150 mm |
| Gases Used | Ar, O2, N2 |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | not released |
| Supported Processes | Supported Processes |
| User Processes | User Processes |
| Maintenance | Maintenance |
 Warning: | This page has not been released yet. |
The Nanoquest II Ion Mill is a...
Contents
Announcements
Currently, use of this tool is restricted to users with high priority deadlines and who are assisting with etch rate characterization. If you believe your process falls into these categories, please create a helpdesk ticket. There will be extensive initial training and practice due to the limited documentation currently published for the tool.
Capabilities
- Etch rates of <2 nm/min up to >40 nm/min for a wide variety of materials
System overview
Hardware details
Each gas can be delivered to either the source or gas ring, but not both
- Pressure
- Ebara EMT3300MK turbo pump
- Base pressure < 10-7
- Actively cooled platen with Dri-chuck mounting system
- 100 mm and 150 mm chucks available
- 5°C - 40°C range
- KRI RFICP220 gridded ion source
- Beam current up to 1500 mA
- Beam voltage up to 1000 V
- 3" dia RF magnetron sputter cathode
Substrate requirements
- 100 mm or 150 mm wafers
- Smaller samples may be mounted to a carrier wafer at the sample mounting station
- 3 mm max height[dubious ]
Material restrictions
The Nanoquest II Ion Mill is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Approved materials
Supported processes
Main article: Nanoquest II Ion Mill/Processes
Initial characterization data for several recipes provided by the vendor are shown in the table below. Data is for thermal oxide and SPR 220. Uniformity data is from the thermal oxide measurement on 150 mm wafers with 10 mm edge exclusion.
| Recipe Name | Oxide Etch Rate (nm/min) |
SPR 220 Etch Rate (nm/min) |
Uniformity (10 mm EE) |
|---|---|---|---|
| LNF_200VB_165IB_40VA | 3.4 | 1.8 | 4.1% |
| LNF_300VB_320IB_60VA | 8.9 | 4.5% | |
| LNF_400VB_510IB_80VA | 16.6 | 14.2 | 3.9% |
| LNF_500VB_740IB_100VA | 27.2 | 21.7 | 4.9% |
| LNF_600VB_500IB_120VA | 23.2 | 18.6 | 1.5% |
| LNF_600VB_990IB_120VA | 40.2 | 35.1 | 3.1% |
| LNF_800VB_500IB_160VA | 25.4 | 3.9% |
Standard operating procedure
Widget text will go here.
Checkout procedure
Please create a helpdesk ticket if you have an urgent, high priority need for the tool and include as much process information as possible. A staff member will contact you regarding your process and schedule.
Maintenance
Process name
