Difference between revisions of "Nanoquest II Ion Mill"
| Line 6: | Line 6: | ||
--> {{#vardefine:restriction|3}} | --> {{#vardefine:restriction|3}} | ||
{{infobox equipment | {{infobox equipment | ||
| + | |manufacturer = [https://intlvac.com/ Intlvac Thin Film] | ||
| + | |model = Nanoquest II | ||
|caption = | |caption = | ||
|materials = | |materials = | ||
|mask = | |mask = | ||
| − | |size = | + | |size = 100 mm, 150 mm |
|chemicals = | |chemicals = | ||
| − | |gases = | + | |gases = [[Ar]], [[O2|O<sub>2</sub>]], [[N2|N<sub>2</sub>]] |
|overview = [[{{PAGENAME}}#System_overview | System Overview]] | |overview = [[{{PAGENAME}}#System_overview | System Overview]] | ||
| − | |sop = [https://link.to.google.doc/preview SOP] | + | |sop = not released <!--[https://link.to.google.doc/preview SOP]--> |
|processes = [[{{PAGENAME}}/Processes|Supported Processes]] | |processes = [[{{PAGENAME}}/Processes|Supported Processes]] | ||
|userprocesses = [[LNF_User:{{PAGENAME}}_user_processes|User Processes]] | |userprocesses = [[LNF_User:{{PAGENAME}}_user_processes|User Processes]] | ||
| Line 29: | Line 31: | ||
==Capabilities== | ==Capabilities== | ||
<!--A more general description of what the tool is capable of doing.--> | <!--A more general description of what the tool is capable of doing.--> | ||
| − | * Etch | + | * Etch rates of <2 nm/min up to >40 nm/min for a wide variety of materials |
| − | |||
| − | |||
| − | |||
==System overview== | ==System overview== | ||
===Hardware details=== | ===Hardware details=== | ||
| − | * Gases | + | * Source Gases |
| + | ** [[Ar]] - 50 sccm | ||
| + | ** [[O2|O<sub>2</sub>]] - 50 sccm | ||
| + | ** [[N2|N<sub>2</sub>]] - 50 sccm | ||
| + | * Gas Ring | ||
| + | ** [[O2|O<sub>2</sub>]] - 50 sccm | ||
| + | ** [[N2|N<sub>2</sub>]] - 50 sccm | ||
| + | {{note|Each gas can be delivered to either the source or gas ring, but not both}} | ||
* Pressure | * Pressure | ||
| − | * | + | ** Ebara EMT3300MK turbo pump |
| − | * | + | ** Base pressure < 10<sup>-7</sup> |
| − | * | + | * Actively cooled platen with Dri-chuck mounting system |
| − | * | + | ** 100 mm and 150 mm chucks available |
| + | ** 5°C - 40°C range | ||
| + | * KRI RFICP220 gridded ion source | ||
| + | ** Beam current up to 1500 mA | ||
| + | ** Beam voltage up to 1000 V | ||
| + | * 3" dia RF magnetron sputter cathode | ||
===Substrate requirements=== | ===Substrate requirements=== | ||
| − | * | + | * 100 mm or 150 mm wafers |
| − | * | + | ** Smaller samples may be mounted to a carrier wafer at the [[sample mounting station]] |
| − | * | + | ** 3 mm max height {{dubious}} |
| − | * | ||
===Material restrictions=== | ===Material restrictions=== | ||
Revision as of 17:34, 17 January 2020
| Nanoquest II Ion Mill | |
|---|---|
| Equipment Details | |
| Manufacturer | Intlvac Thin Film |
| Model | Nanoquest II |
| Technology | Ion milling |
| Materials Restriction | Metals |
| Sample Size | 100 mm, 150 mm |
| Gases Used | Ar, O2, N2 |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | not released |
| Supported Processes | Supported Processes |
| User Processes | User Processes |
| Maintenance | Maintenance |
 Warning: | This page has not been released yet. |
The Nanoquest II Ion Mill is a...
Contents
Announcements
Capabilities
- Etch rates of <2 nm/min up to >40 nm/min for a wide variety of materials
System overview
Hardware details
- Pressure
- Ebara EMT3300MK turbo pump
- Base pressure < 10-7
- Actively cooled platen with Dri-chuck mounting system
- 100 mm and 150 mm chucks available
- 5°C - 40°C range
- KRI RFICP220 gridded ion source
- Beam current up to 1500 mA
- Beam voltage up to 1000 V
- 3" dia RF magnetron sputter cathode
Substrate requirements
- 100 mm or 150 mm wafers
- Smaller samples may be mounted to a carrier wafer at the sample mounting station
- 3 mm max height[dubious ]
Material restrictions
The Nanoquest II Ion Mill is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Supported processes
There are several processes for this tool supported by the LNF, which are described in more detail on the Processes page.
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on Nanoquest II Ion Mill user processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
Standard operating procedure
Widget text will go here.
Checkout procedure
Please create a helpdesk ticket if you have an urgent, high priority need for the tool and include as much process information as possible. A staff member will contact you regarding your process and schedule.
Maintenance
Process name
