Difference between revisions of "Nickel"

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===Deposition Equipment===
 
===Deposition Equipment===
*Tools in the LNF for depositing this material.
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*Evaporation
 
** [[Angstrom Engineering Evovac Evaporator]]
 
** [[Angstrom Engineering Evovac Evaporator]]
 
** [[Cooke Evaporator]]
 
** [[Cooke Evaporator]]
 
** [[SJ-20 Evaporator]]
 
** [[SJ-20 Evaporator]]
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*Sputtering
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** [[PVD 75 Proline]]
  
 
===Etching Equipment===
 
===Etching Equipment===
*Tools in the LNF for etching this material.
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* Wet Etching
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** [[Acid Bench 92]]
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** [[Acid Bench 12]]
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** [[Acid Bench 73]]
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* RIE
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** [[Nanoquest II Ion Mill]]
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===Characterization Equipment===
 
===Characterization Equipment===
 
*Metrology/Characterization equipment available in the LNF for measuring physical, optical, and surface properties of this material.
 
*Metrology/Characterization equipment available in the LNF for measuring physical, optical, and surface properties of this material.
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==Processes==
 
==Processes==
 
===Deposition Processes===
 
===Deposition Processes===
* List of technologies for depositing this material and relevant process information specific to this material associated with this equipment/type of process.
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* [[Electron beam evaporation]]
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* [[Sputter deposition]]
  
 
===Etching Processes===
 
===Etching Processes===
* List of technologies for etching/pattering this material and relevant process information specific to this material associated with this equipment/type of process.
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* Nickel can be etched with [[Piranha Etch]] (380 nm/min), dilute [[Aqua Regia]] (100 nm/min)
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*[[Plasma etching]]
  
 
===Characterization Processes===
 
===Characterization Processes===
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==References==
 
==References==
*Citations/references for this material, review articles. If possible, examples of users publications which includes the material.
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* [https://drive.google.com/open?id=0B7eVu3mcqumAbTQ0aFBxXzYyNDg KR Williams, K Gupta, M Wasilik, "Etch Rates for Micromachining Processing - Part II", JMEMS vol. 12 No 6, Dec 2003]

Latest revision as of 11:14, 24 April 2020

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Nickel (Ni) is an element with the atomic number 28. It is silvery-white and lustrous in appearance with a slightly golden tinge. Nickel is a transition metal and is a very hard and ductile material.

Equipment

Process technologies that can be used to deposit/pattern this material.

Deposition Equipment

Etching Equipment

Characterization Equipment

  • Metrology/Characterization equipment available in the LNF for measuring physical, optical, and surface properties of this material.

Applications

  • Discuss common uses/applications for this material. Why this materials is used in the LNF?

Processes

Deposition Processes

Etching Processes

Characterization Processes

  • List of techniques for metrology/characterization can be used with this material and relevant process information specific to this material associated with this equipment/type of process.

Other Relevant Material Information

Technical Data

  • Charts or specific LNF related data for this material.

References