Difference between revisions of "PMGI SF 6"
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==Procedure== | ==Procedure== | ||
===Notes=== | ===Notes=== | ||
| − | |||
*These recipes will be for 3500Å (2000rpm open lid and 1500rmp closed lid) of SF6, allowing you to lift off upto 2800Å of metal. | *These recipes will be for 3500Å (2000rpm open lid and 1500rmp closed lid) of SF6, allowing you to lift off upto 2800Å of metal. | ||
*These are all for Si. Other materials will have different reflections and this may impact the required exposures. | *These are all for Si. Other materials will have different reflections and this may impact the required exposures. | ||
| − | + | ||
| − | |||
===Process=== | ===Process=== | ||
| − | *Spin SF 6 on CEE 100 | + | *Spin SF 6 on CEE 100 |
| + | **2K for open lid for 3500Å | ||
| + | **1.5k for closed lid for 3500Å | ||
*Bake for 5min at 190°C, lid down on hotplates in 1440C | *Bake for 5min at 190°C, lid down on hotplates in 1440C | ||
====Contact Aligners==== | ====Contact Aligners==== | ||
| + | These recipes are for 2um spacing between features. | ||
| + | |||
'''SPR 220 3.0 process''' | '''SPR 220 3.0 process''' | ||
*Spin SPR 220 3.0 | *Spin SPR 220 3.0 | ||
Revision as of 16:41, 6 April 2021
 Warning: | This page has not been released yet. |
| About this Process | |
|---|---|
| Process Details | |
| Equipment | PMGI SF 6 |
| Technology | Lift-off |
PGMI SF 6 is a lift-off resist polydimethylglutarimide (PMGI) that is desinged for lift-off process and sacrificial release layers. It is used in combination with conventional photo resist to create and undercut or step feature facilitating clean and easy liftoff minimizing, or eliminating stringers and edge roughness.
Contents
Procedure
Notes
- These recipes will be for 3500Å (2000rpm open lid and 1500rmp closed lid) of SF6, allowing you to lift off upto 2800Å of metal.
- These are all for Si. Other materials will have different reflections and this may impact the required exposures.
Process
- Spin SF 6 on CEE 100
- 2K for open lid for 3500Å
- 1.5k for closed lid for 3500Å
- Bake for 5min at 190°C, lid down on hotplates in 1440C
Contact Aligners
These recipes are for 2um spacing between features.
SPR 220 3.0 process
- Spin SPR 220 3.0
- 3K spin
- 3um RRD on the ACS
- Bake at 115°C for 90 seconds
- Expose for 7 seconds
- Develop
- 30 sec MIF 300 spray develop on the ACS
- DP 25-25 726 puddle develop on the CEE developers
1813 Process
- Spin 1813 at 4K spin (recipe #4 on CEE spinners)
- Bake for @110°C for 4 min on hotplate
- Expose 4.0-4.5 seconds with 20 mJ/sec broad band light
- Develop
- 30 sec MIF 300 spray develop on the ACS
- DP 20-20 726 puddle develop on the CEE developers
Stepper
Coming soon.
Characterization
Spin Curve
PMGI SF 6 spin curve on CEE 100.
Affects of develop time
1813/LOR System
Spray Develop
Puddle Develop
