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About this Process
Process Details
Equipment PMGI SF 6
Technology Lift-off

PGMI SF 6 is a lift-off resist polydimethylglutarimide (PMGI) that is desinged for lift-off process and sacrificial release layers. It is used in combination with conventional photo resist to create and undercut or step feature facilitating clean and easy liftoff minimizing, or eliminating stringers and edge roughness.



  • These recipes will be for 3500Å (2000rpm open lid and 1500rmp closed lid) of SF6, allowing you to lift off upto 2800Å of metal.
  • These are all for Si. Other materials will have different reflections and this may impact the required exposures.


  • Spin SF 6 on CEE 100
    • 2K for open lid for 3500Å
    • 1.5k for closed lid for 3500Å
  • Bake for 5min at 190°C, lid down on hotplates in 1440C

Contact Aligners

These recipes are for 2um spacing between features.

SPR 220 3.0 process

  • Spin SPR 220 3.0
    • 3K spin
    • 3um RRD on the ACS
  • Bake at 115°C for 90 seconds
  • Expose for 7 seconds
  • Develop
    • 30 sec MIF 300 spray develop on the ACS
    • DP 25-25 726 puddle develop on the CEE developers

1813 Process

  • Spin 1813 at 4K spin (recipe #4 on CEE spinners)
  • Bake for @110°C for 4 min on hotplate
  • Expose 4.0-4.5 seconds with 20 mJ/sec broad band light
  • Develop
    • 30 sec MIF 300 spray develop on the ACS
    • DP 20-20 726 puddle develop on the CEE developers


Coming soon.


Spin Curve

PMGI SF 6 spin curve on CEE 100.

Affects of develop time

1813/LOR System

Spray Develop


Puddle Develop