View source for PMMA

{{warning|This page has not been released yet.}}

[[PMMA]] is a positive [[electron beam lithography|e-beam lithography]] resist from [http://www.microchem.com/ MicroChem]. The LNF offers the 950 series in several viscosities.

==Processes==
PMMA processes vary depending on the design requirements. A few examples that work for many situations are listed below. For assistance characterizing a PMMA process, please create a helpdesk ticket.

==Spin Curve==
* There are currently no process SOPs defined for this chemical.

==Equipment==
PMMA spinning and baking should be performed in the [[E-Beam Spinner_Hot-Plate Bench 21|E-Beam Spinner/Hot-Plate Bench]]. Exposure is done with the [[JEOL JBX-6300FS Electron Beam Lithography System|JEOL E-Beam]]. Development is done at the [[E-Beam Solvent Bench 22|E-Beam Solvent Bench]].

{| class="wikitable" border="1"
|-
! Process
! Thickness (nm)
! Notes
|-
| [[PMMA A4 4krpm]]
| 200
| What's it good for?
|-
| row 2, cell 1
| row 2, cell 2
| row 2, cell 3
|}

==Technical Data Sheet==
* [http://microchem.com/pdf/PMMA_Data_Sheet.pdf PMMA Data Sheet]

==Safety Data Sheet==
* There are currently no Safety Data Sheets (SDSes) for this chemical.

<!--
==References==
* Other links that are useful
-->

[[Category:Photoresist]]