PSC 122M Mask Cleaner

From LNF Wiki
Revision as of 12:31, 18 October 2022 by Jeremeys (talk | contribs) (→‎Supported processes)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search
PSC 122M Mask Cleaner
PSC122M.jpg
Mask Cleaner
Equipment Details
Technology Wafer Clean
Materials Restriction Metals
Material Processed n/a
Mask Materials 4", 5", 7"
Sample Size 4" wafers, 6" wafers
Chemicals Used Micro 90
Gases Used n/a
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
User Processes User Processes
Maintenance Maintenance


The PSC 122M Mask Cleaner is a standardized solution for submicron cleaning of Photomasks, reticles, and substrates. The PSC 122M Mask Cleaner is a cost effective system that utilizes high pressure De-ionized water spray along with an optional surfactant dispense and brush, that allows for cleaning. The drying technique uses a variable spin with nitrogen and a heat lamp.

Announcements

  • [2/5/2021] The mask cleaner is installed and recipes are being developed
  • [3/26/2020] The PSC 122M has arrived at the lab
  • [3/17/2020] The PSC 122M has shipped. There is currently no timeline for installation.
  • [3/30/2021] Mask Cleaner is ready for user training
  • The location of the tool will be 1440B
  • Equipment Specs

Capabilities

Cleaning of substrates such as masks and wafers

System overview

Hardware details

  • The surfactant used in this system is: Micro 90
  • N2 blowoff
  • Heater for drying

Substrate requirements

Masks are clipped in and wafers are held on using a vacuum pulldown. Chucks can be added and removed with 2 screws. There are chucks available for the following sizes:

  • 4" wafers
  • 6" wafers
  • 4" masks
  • 5" masks
  • 7" masks

Material restrictions

The PSC 122M Mask Cleaner is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported processes

There are several recipes for this tool supported by the LNF, a list of processes can be found in the tool SOP found below.

Users are permitted to change Recipe #6 ONLY. Recipe #6 is a designated custom recipe slot wherein users can enter custom-recipe parameters to meet their cleaning needs. Editing Recipes #1 through #5 will result in immediate loss of access to the tool.

If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.

Standard operating procedure

Full Standard Operating Procedure Widget text will go here.

Quick Reference Standard Operating Procedure The quick reference SOP will be printed and placed at the tool Widget text will go here.

Checkout procedure

  1. Read through this page and the Standard Operating Procedure above.
  2. Complete the Mask Cleaner Quiz.
    1. Find an available time for checkout here.
    2. Verify that the tool is available in the LNF Online Services at the time you are requesting.
    3. After confirmation that the event is scheduled in Calendly, invite the staff member assigned to your event to a Staff Support reservation at that time.
  3. Create a helpdesk ticket for final confirmation of your checkout appointment.
  4. If you pass the quiz the tool engineer will authorize you on the tool. If not you will be contacted to repeat.