Difference between revisions of "Photoresist"
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! Photoresist | ! Photoresist | ||
| − | ! | + | ! RIE |
| − | |||
|- | |- | ||
| SPR 955 (0.9) | | SPR 955 (0.9) | ||
| − | | | + | |data-sort-value="2"|Good |
| − | | | ||
|- | |- | ||
| SPR 220 (3.0) | | SPR 220 (3.0) | ||
| − | | | + | |data-sort-value="1"|Good |
| − | | | + | |- |
| + | | SPR 220 (7.0) | ||
| + | |data-sort-value="3"|Good | ||
| + | |- | ||
| + | | KMPR 1010 | ||
| + | |data-sort-value="4"|Good | ||
| + | |- | ||
| + | | 9260 | ||
| + | |data-sort-value="10"|Good | ||
|} | |} | ||
Revision as of 10:36, 26 June 2018
Photoresist is a photoactive polymer suspended in a solvent used in Lithography processing. We have positive novolak based resists for use with our mask aligners and stepper, negative epoxy based resists ..... and e-beam resists for use with the JOEL.
LNF Supported Photoresists
| Photoresist | RIE |
|---|---|
| SPR 955 (0.9) | Good |
| SPR 220 (3.0) | Good |
| SPR 220 (7.0) | Good |
| KMPR 1010 | Good |
| 9260 | Good |
Applications
Etch
- RIE - Photoresist used in RIE needs to be thermally stable and resistant to the etch chemistry.
- Wet Etch - A photoresists adhesion is very important as any adhesion failure greatly increases undercut.
Deposition
- Liftoff - Need a photoresist profile that prevents sidewall deposition. Often this is done by using a bi-layer stack and undercutting the bottom layer.
- Plating
- Molding
Below you can find a list of public and private approved photoresists for the LNF. If you would like to bring a new photoresist into the robin lab or clean room, then please create a help desk ticket or email info@lnf.umich.edu. All photoresists must be handled using the green polychloroprene gloves.
Photoresist Table
| Photoresists | ||||||
|---|---|---|---|---|---|---|
| Photoresist | LNF/Private | Tool | +/-/Reversible | Stored | Notes | |
| 950K PMMA 6% | LNF | E-Beam Spinner | ? | Photoresist cabinet 1440C; 1480 photoresist | - | |
| AZ5214-E (IR) | Private | Not using | +, Reversible | No longer stored | - | |
| AZ9260 | Sold through store | ? | + | ? | Thick photoresist, high resolution | |
| KMPR 1010 | Private | CEE 100CB Spinner | - | ? | UV, E-beam, x-ray, contact aligner | |
| KMPR 1025 | Private | CEE 100CB Spinner | - | ? | UV, E-beam, or x-ray | |
| LOR 10B Lift-Off Resist | Private | CEE 100CB Spinner | - | ? | - | |
| Omni Coat | ? | ? | ? | ? | - | |
| S1813 | LNF | CEE 100 and CEE 200 Spinners | + | Photoresist cabinet 1440C | - | |
| SC1827 | LNF/discontinued | CEE 100 and CEE 200 Spinners | + | Photoresist cabinet 1440C | - | |
| SPR 220-3.0 | LNF | ACS 200 Cluster Tool, CEE 100 and CEE 200 Spinners | + | Photoresist cabinet 1440C | - | |
| SPR 220-7.0 | LNF/Private | CEE 100 and CEE 200 Spinners | + | Photoresist cabinet 1440C | LNF provides the photoresist for the CEE 200CB Spinner #1, but it must be purchased if you want to use it on the CEE 100CB Spinner | |
| SPR 955-0.9 | LNF | ACS 200 Cluster Tool, CEE 100 and CEE 200 Spinners | + | Photoresist cabinet 1440C | Thinner viscosity, higher resolution | |
| SU-8 2010 | ? | ROBIN Lab | - | Epoxy photoresist for micromachining | ||
| SU-8 2005 | ? | ROBIN Lab | - | Epoxy photoresist for micromachining | ||
| SU-8 2050 | ? | ROBIN Lab | - | Epoxy photoresist for micromachining | ||
