Difference between revisions of "Photoresist"

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Revision as of 10:36, 26 June 2018

Photoresist is a photoactive polymer suspended in a solvent used in Lithography processing. We have positive novolak based resists for use with our mask aligners and stepper, negative epoxy based resists ..... and e-beam resists for use with the JOEL.


LNF Supported Photoresists

Photoresist RIE
SPR 955 (0.9) Good
SPR 220 (3.0) Good
SPR 220 (7.0) Good
KMPR 1010 Good
9260 Bad

Applications

Etch

  • RIE - Photoresist used in RIE needs to be thermally stable and resistant to the etch chemistry.
  • Wet Etch - A photoresists adhesion is very important as any adhesion failure greatly increases undercut.

Deposition

  • Liftoff - Need a photoresist profile that prevents sidewall deposition. Often this is done by using a bi-layer stack and undercutting the bottom layer.
  • Plating
  • Molding


Below you can find a list of public and private approved photoresists for the LNF. If you would like to bring a new photoresist into the robin lab or clean room, then please create a help desk ticket or email info@lnf.umich.edu. All photoresists must be handled using the green polychloroprene gloves.


Photoresist Table

Photoresists
Photoresist LNF/Private Tool +/-/Reversible Stored Notes
950K PMMA 6% LNF E-Beam Spinner ? Photoresist cabinet 1440C; 1480 photoresist -
AZ5214-E (IR) Private Not using +, Reversible No longer stored -
AZ9260 Sold through store ? + ? Thick photoresist, high resolution
KMPR 1010 Private CEE 100CB Spinner - ? UV, E-beam, x-ray, contact aligner
KMPR 1025 Private CEE 100CB Spinner - ? UV, E-beam, or x-ray
LOR 10B Lift-Off Resist Private CEE 100CB Spinner - ? -
Omni Coat ? ? ? ? -
S1813 LNF CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C -
SC1827 LNF/discontinued CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C -
SPR 220-3.0 LNF ACS 200 Cluster Tool, CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C -
SPR 220-7.0 LNF/Private CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C LNF provides the photoresist for the CEE 200CB Spinner #1, but it must be purchased if you want to use it on the CEE 100CB Spinner
SPR 955-0.9 LNF ACS 200 Cluster Tool, CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C Thinner viscosity, higher resolution
SU-8 2010 ? ROBIN Lab - Epoxy photoresist for micromachining
SU-8 2005 ? ROBIN Lab - Epoxy photoresist for micromachining
SU-8 2050 ? ROBIN Lab - Epoxy photoresist for micromachining