Photoresist

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Photoresist is a photoactive polymer suspended in a solvent used in Lithography processing. We have positive novolak based resists for use with our mask aligners and stepper, negative epoxy based resists ..... and e-beam resists for use with the JOEL.


LNF Supported Photoresists

Photoresist header 2 header 3
SPR 955 (0.9) X X
SPR 220 (3.0) X X

Applications

Etch

  • RIE - Photoresist used in RIE needs to be thermally stable and resistant to the etch chemistry.
  • Wet Etch - A photoresists adhesion is very important as any adhesion failure greatly increases undercut.

Deposition

  • Liftoff - Need a photoresist profile that prevents sidewall deposition. Often this is done by using a bi-layer stack and undercutting the bottom layer.
  • Plating
  • Molding


Below you can find a list of public and private approved photoresists for the LNF. If you would like to bring a new photoresist into the robin lab or clean room, then please create a help desk ticket or email info@lnf.umich.edu. All photoresists must be handled using the green polychloroprene gloves.


Photoresist Table

Photoresists
Photoresist LNF/Private Tool +/-/Reversible Stored Notes
950K PMMA 6% LNF E-Beam Spinner ? Photoresist cabinet 1440C; 1480 photoresist -
AZ5214-E (IR) Private Not using +, Reversible No longer stored -
AZ9260 Sold through store ? + ? Thick photoresist, high resolution
KMPR 1010 Private CEE 100CB Spinner - ? UV, E-beam, x-ray, contact aligner
KMPR 1025 Private CEE 100CB Spinner - ? UV, E-beam, or x-ray
LOR 10B Lift-Off Resist Private CEE 100CB Spinner - ? -
Omni Coat ? ? ? ? -
S1813 LNF CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C -
SC1827 LNF/discontinued CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C -
SPR 220-3.0 LNF ACS 200 Cluster Tool, CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C -
SPR 220-7.0 LNF/Private CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C LNF provides the photoresist for the CEE 200CB Spinner #1, but it must be purchased if you want to use it on the CEE 100CB Spinner
SPR 955-0.9 LNF ACS 200 Cluster Tool, CEE 100 and CEE 200 Spinners + Photoresist cabinet 1440C Thinner viscosity, higher resolution
SU-8 2010 ? ROBIN Lab - Epoxy photoresist for micromachining
SU-8 2005 ? ROBIN Lab - Epoxy photoresist for micromachining
SU-8 2050 ? ROBIN Lab - Epoxy photoresist for micromachining