Difference between revisions of "Piranha Etch"

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Will clean organic residue off of wafer in approximately 10-20 min
 
Will clean organic residue off of wafer in approximately 10-20 min
  
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== Standard Operating Procedure ==
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==Limitations==
 
==Limitations==
 
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Will attack any polymers on the surface
 
Will attack any polymers on the surface

Revision as of 11:20, 16 March 2018


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About this Process
Process Details
Equipment Piranha Etch
Technology [[]]
Chemicals Used Sulfuric Acid, Hydrogen Peroxide
Date Created 5/12/15
Date Modified 5/12/15
Authored By Rob Hower



Piranha is a heated strongly oxidizing mixture of sulfuric acid and hydrogen peroxide used to remove organic material from the surface of samples.

Chemicals

Locations

Characterization

When the two chemicals are mixed a very exothermic reaction will occur. It will heat to 120-150C almost instantly. This is hot enough to soften many plastics, including the deck of the benches.

Etch Rate

Will clean organic residue off of wafer in approximately 10-20 min

Standard Operating Procedure

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Limitations

Will attack any polymers on the surface