Difference between revisions of "Piranha Etch"

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Revision as of 09:35, 19 May 2015


Warning Warning: This page has not been released yet.
About this Process
Process Details
Equipment Piranha Etch
Technology [[]]
Chemicals Used Sulfuric Acid, Hydrogen Peroxide
Date Created 5/12/15
Date Modified 5/12/15
Authored By Rob Hower



Chemicals

Locations

Characterization

Etch Rate

Will clean organic residue off of wafer in approximately 10-20 min

Mask Selectivity

Limitations

Will attack any polymers on the surface