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|About this Process|
|Chemicals Used||Sulfuric Acid, Hydrogen Peroxide|
|Authored By||Rob Hower|
Piranha is a heated strongly oxidizing mixture of sulfuric acid and hydrogen peroxide used to remove organic material from the surface of samples.
- Acid Bench 02 CMOS Clean 4" and 6" Silicon
- Acid Bench 12 Metals allowed 4" and 6" Silicon and Glass
- Acid Bench 72 Pieces to 6" wafers any material
- Acid Bench 73 Pieces to 6" wafers any material
- Acid Bench 92 Pieces to 4" wafers any material
When the two chemicals are mixed a very exothermic reaction will occur. It will heat to 120-150C almost instantly. This is hot enough to soften many plastics, including the deck of the benches.
Will clean organic residue off of wafer in approximately 10-20 min
Standard Operating Procedure
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Will attack any polymers on the surface