Piranha Etch

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About this Process
Process Details
Equipment Piranha Etch
Technology [[]]
Chemicals Used Sulfuric Acid, Hydrogen Peroxide
Date Created 5/12/15
Date Modified 5/12/15
Authored By Rob Hower



The term ‘piranha’ refers to a hot solution of sulfuric acid and hydrogen peroxide. Piranha strips photoresist and other organics by oxidizing them, and removes metals by forming complexes that stay in the solution.

Chemicals

Locations

Characterization

When the two chemicals are mixed a very exothermic reaction will occur. It will heat to 120-150C almost instantly. This is hot enough to soften many plastics, including the deck of the benches.

Etch Rate

Will clean organic residue off of wafer in approximately 10-20 min

Standard Operating Procedure

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Limitations

Will attack any polymers on the surface