Piranha Etch

From LNF Wiki
Jump to navigation Jump to search
Warning Warning: This page has not been released yet.
About this Process
Process Details
Equipment Piranha Etch
Technology [[]]
Chemicals Used Sulfuric Acid, Hydrogen Peroxide
Date Created 5/12/15
Date Modified 5/12/15
Authored By Rob Hower



Etch Rate

Will clean organic residue off of wafer in approximately 10-20 min

Mask Selectivity


Will attack any polymers on the surface