Piranha Etch

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About this Process
Process Details
Equipment Piranha Etch
Technology [[]]
Chemicals Used Sulfuric Acid, Hydrogen Peroxide
Date Created 5/12/15
Date Modified 5/12/15
Authored By Rob Hower



Chemicals

  • [Acid]
  • [{UP(Public.SEM In-line)}In-LineSEMToolSOP.pdf|Tool SOP]
  • Hydrogen Peroxide

Locations

Characterization

Etch Rate

Will clean organic residue off of wafer in approximately 10-20 min

Mask Selectivity

Limitations

Will attack any polymers on the surface