Difference between revisions of "Plasma processing"

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==Equipment==
 
==Equipment==
 
For a complete list of plasma processing equipment available at the LNF, please see [[:Category:Plasma processing equipment]] or the appropriate technology listed above.
 
For a complete list of plasma processing equipment available at the LNF, please see [[:Category:Plasma processing equipment]] or the appropriate technology listed above.
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[[Category:Plasma processing]]

Revision as of 12:11, 10 August 2015

Plasma processing
Rieoperation.svg
Technology Details
Equipment List of plasma processing equipment

Plasma processing refers to any microfabrication process that uses a plasma discharge to achieve the process results. There are deposition processes like PECVD and sputtering, etching

Technologies

There are a variety of plasma processing technologies commonly used in the LNF, including:

Plasma deposition

Main article: Plasma deposition

Plasma etching

Main article: Plasma etching

Plasma etching uses chemical and physical reactions between the plasma and the surface of the sample to remove a desired material from the sample. It is a highly controllable process compared to other forms of etching.

Plasma cleaning

Main article: Plasma cleaning

Surface activation

Main article: Surface activation

Equipment

For a complete list of plasma processing equipment available at the LNF, please see Category:Plasma processing equipment or the appropriate technology listed above.