|Equipment||List of plasma processing equipment|
There are a variety of plasma processing technologies commonly used in the LNF, including:
Plasma etching uses chemical and physical reactions between the plasma and the surface of the sample to remove a desired material from the sample. It is a highly controllable process compared to other forms of etching.
For a complete list of plasma processing equipment available at the LNF, please see Category:Plasma processing equipment or the appropriate technology listed above.