Difference between revisions of "Plasmatherm 790"

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{{#vardefine:toolid|10030}} {{#vardefine:technology|RIE}} {{resource}} [[Category:PECVD]] {{infobox equipment
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{{#vardefine:toolid|10030}} {{#vardefine:technology|RIE}} {{#vardefine:restriction|3}} [[Category:PECVD_equipment]]  
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{{infobox equipment
 
|restriction = [[{{PAGENAME}}#Material_Restrictions|Metals]]
 
|restriction = [[{{PAGENAME}}#Material_Restrictions|Metals]]
 
|materials = [[Si]], [[SiO2|SiO<sub>2</sub>]]
 
|materials = [[Si]], [[SiO2|SiO<sub>2</sub>]]
 
|mask = [[Photoresist|PR]], [[SiO2|SiO<sub>2</sub>]]
 
|mask = [[Photoresist|PR]], [[SiO2|SiO<sub>2</sub>]]
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|gases = [[Ar]], [[CH4|CH<sub>4</sub>]], [[CHF3|CHF<sub>3</sub>]], [[CF4|CF<sub>4</sub>]],  
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|gases = [[Argon|Ar]], [[Methane|CH<sub>4</sub>]], [[Fluoroform|CHF<sub>3</sub>]], [[Tetrafluoromethane|CF<sub>4</sub>]],  
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[[H2|H<sub>2</sub>]], [[O2|O<sub>2</sub>]], [[SF6|SF<sub>6</sub>]]
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[[H2|H<sub>2</sub>]], [[Oxygen|O<sub>2</sub>]], [[SF6|SF<sub>6</sub>]]
 
|overview = [[{{PAGENAME}}#System_Overview | System Overview]]
 
|overview = [[{{PAGENAME}}#System_Overview | System Overview]]
−
|sop = [https://docs.google.com/a/lnf.umich.edu/document/d/1iRHIBHG0BvqpsX1quhb8YszCImOkyvzJx_SxqluPOt8/preview SOP]
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|sop = [[{{PAGENAME}}#Standard_Operating_Procedure | SOP]]
 
|processes = [[{{PAGENAME}}/Processes|Supported Processes]]
 
|processes = [[{{PAGENAME}}/Processes|Supported Processes]]
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|userprocesses = [[LNF_User:Plasmathem_790_User_Processes|User Processes]] }} {{warning|This page has not been released yet.}} The Plasmatherm 790 is a dual chamber parallel plate tool.  The left chamber is configured for reactive ion etching (RIE) while the right chamber is configured for plasma enhanced chemical vapor deposition (PECVD).
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|userprocesses = [[LNF_User:Plasmatherm_790_User_Processes|User Processes]] }}  
 +
The Plasmatherm 790 is a dual chamber parallel plate tool.  The left chamber is configured for [[Reactive ion etching|reactive ion etching (RIE)]] while the right chamber is configured for [[PECVD|plasma enhanced chemical vapor deposition (PECVD)]].  The RIE chamber is significantly slower than other etchers available in the lab, allowing greater depth control on thin films.  The PECVD chamber is also designed to deposit at a lower rate than the [[GSI PECVD]] and [[P5000 PECVD]] - the smaller building blocks help improve film quality.  This tool has almost no material restrictions, allowing a wide variety of processing.
 
   
 
   
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==Announcements==
 
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*Update this with announcements as necessary
 
  
 
==Capabilities==
 
==Capabilities==
 
<!--A more general description of what the tool is capable of doing.-->
 
<!--A more general description of what the tool is capable of doing.-->
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* Etch Rate
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* Wide variety of materials processed
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* Resolution
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* Wide variety of gases available
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* Aspect Ratio
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* Generally slower etch rates <1000 Å/min
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* Thickness range
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* Generally slow PECVD deposition rates <10 Å/sec
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==System Overview==
 
==System Overview==
Line 26: Line 24:
 
* RIE Gases
 
* RIE Gases
 
** [[Argon|Ar]] - 139 sccm
 
** [[Argon|Ar]] - 139 sccm
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** [[Methane|CH<sub>4</sub>]] - 18 sccm
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** [[Methane|CH<sub>4</sub>]] - 14 sccm
 
** [[Fluoroform|CHF<sub>3</sub>]] - 50 sccm
 
** [[Fluoroform|CHF<sub>3</sub>]] - 50 sccm
 
** [[Tetrafluoromethane|CF<sub>4</sub>]] - 42 sccm
 
** [[Tetrafluoromethane|CF<sub>4</sub>]] - 42 sccm
 
** [[Hydrogen|H<sub>2</sub>]] - 101 sccm
 
** [[Hydrogen|H<sub>2</sub>]] - 101 sccm
 
** [[Oxygen|O<sub>2</sub>]] - 100 sccm
 
** [[Oxygen|O<sub>2</sub>]] - 100 sccm
−
** [[Sulfur Hexafluoride|SF<sub>6</sub>]] - 52 sccm
+
** [[Sulfur hexafluoride|SF<sub>6</sub>]] - 52 sccm
 
* PECVD Gases
 
* PECVD Gases
 
**  [[Methane|CH<sub>4</sub>]] - 72 sccm
 
**  [[Methane|CH<sub>4</sub>]] - 72 sccm
−
** [[Tetrafluoromethane|CF<sub>4</sub>O<sub>2</sub>]] - 420 sccm
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** [[Tetrafluoromethane|CF<sub>4</sub> - 4% O<sub>2</sub>]] - 420 sccm
 
** [[Helium|He]] - 500 sccm  
 
** [[Helium|He]] - 500 sccm  
 
** [[Nitrogen|N<sub>2</sub>]] - 2000 sccm
 
** [[Nitrogen|N<sub>2</sub>]] - 2000 sccm
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** [[Nitrous Oxide|N<sub>2</sub>O]] - 497 sccm
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** [[Nitrous oxide|N<sub>2</sub>O]] - 497 sccm
 
** [[Ammonia|NH<sub>3</sub>]] - 3 sccm
 
** [[Ammonia|NH<sub>3</sub>]] - 3 sccm
 
** [[Silane|SiH<sub>4</sub>]] - 6 sccm
 
** [[Silane|SiH<sub>4</sub>]] - 6 sccm
  
 
* Pressure
 
* Pressure
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** RIE: 5 - 300 mTorr
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** RIE: 1 Torr Guage
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** PECVD: 50 - 2000 mTorr
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** PECVD: 2 Torr Gauge
  
 
* Chuck
 
* Chuck
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===Material Restrictions===
 
===Material Restrictions===
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Below is a list of approved and restricted materials for the tool. "Approved" means the material is allowed in the tool under normal circumstances. "Not Allowed" means the material may never be used in the tool. If a material is not listed, it may be possible to use the material under certain conditions. Please contact a tool engineer via the helpdesk ticket system for any material requests or questions.
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The Plasmatherm 790 is designated as a metals class tool. Below is a list of approved and restricted materials for the Plasmatherm 790. "Approved" means the material is allowed in the tool under normal circumstances. "Not Allowed" means the material may never be used in the tool. If a material is not listed, it may be possible to use the material under certain conditions. Please contact a tool engineer via the helpdesk ticket system for any material requests or questions.
 +
 
 +
====Left Chamber====
 +
{{#widget:ApprovedMaterials|toolid={{#var:toolid}}1|header=N}}
  
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{{#widget:ApprovedMaterials|toolid={{#var:toolid}}|header=N}}
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====Right Chamber====
 +
The right chamber has the same restrictions as the left except polymers (such as photoresist) are not allowed unless their melting temperature is significantly higher than the process temperature (please create a helpdesk ticket for this).
  
 
==Supported Processes==  
 
==Supported Processes==  
 
There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Processes/]] page.
 
There are several processes for this tool supported by the LNF, which are described in more detail on the [[/Processes/]] page.
  
−
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes|]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
+
In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on [[LNF User:{{BASEPAGENAME}} User Processes]]. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
 +
 
 +
The latest PECVD qualification data is shown below.
 +
 
 +
{{#widget:Iframe
 +
|url=https://docs.google.com/spreadsheets/d/1jDSV00jZ-1vppt2MgGRAJyXRvxEE3rJIlXtngODM9-0/pubhtml?gid=1394489689&amp;single=true&amp;widget=true&amp;headers=false
 +
|width=650
 +
|height=260
 +
|border=1
 +
}}
  
 
==Standard Operating Procedure==
 
==Standard Operating Procedure==
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<!-- To include a document from google docs, use the line below, replace "googledocid" with the ID for the document. Remember, to make this visible, you must set Sharing for the document to "Anyone with the link can view". -->
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* [https://drive.google.com/open?id=1ISeylrCbnE2g8E1acoAKEbNmKXi6CH2f System Overview]
−
{{#widget:GoogleDoc|key=1iRHIBHG0BvqpsX1quhb8YszCImOkyvzJx_SxqluPOt8}}
+
* [https://drive.google.com/file/d/0B3k-qgz56T_4RVJqUHp3eEsySUk/view?usp=sharing&resourcekey=0-ClQBXI80fBwIL1FR48tt7w RIE SOP]
 +
* [https://drive.google.com/open?id=1iWQMtPGj8M9KQmTBJgTBk6jxuMiWCSk4 PECVD SOP]
 +
* [https://drive.google.com/open?id=1QiY9Xwt1ucw9axn4JTanLy-OA4QeXEIU Troubleshooting]
  
 
==Checkout Procedure==
 
==Checkout Procedure==
 
<!-- Describe the checkout procedure for the tool. For example: -->
 
<!-- Describe the checkout procedure for the tool. For example: -->
−
# Read through the Standard Operating Procedure above.
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# Read through the User Manual above.
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# Complete the training request form [<link> here].
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# Accurately complete the [https://docs.google.com/a/lnf.umich.edu/forms/d/e/1FAIpQLSff-AcfmVpwlCTYKOQVe_sV0Rz_IE_B4vn0Pml7HX3eHcOC2w/viewform SOP quiz]. You may retake as necessary until all answers are correct.
−
# Create a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} helpdesk] ticket requesting training.
+
# For RIE, complete the [https://docs.google.com/forms/d/e/1FAIpQLSf4FcYP1XIoE-scXpXtmaegIzceSVe3uaR8e9P3K3LQAvn20w/viewform process request form].
−
# A tool engineer will schedule a time for initial training.
+
# Create a [http://ssel-sched.eecs.umich.edu/sselScheduler/ResourceContact.aspx?tabindex=3&path=0:0:0:{{#var:toolid}} helpdesk ticket] requesting a checkout session.
−
# Practice with your mentor or another authorized user until you are comfortable with tool operation.
+
# Authorization will be provided pending successful completion of the quiz and demonstration of proper tool use in the presence of a tool engineer.
−
# Complete the SOP quiz [https://docs.google.com/a/lnf.umich.edu/forms/d/1CBvtjKtkjMqKE0OP6Gm2dIBxlyF-DDZvQTfM4zEgDZc/viewform here].
 
−
# Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
 
−
 
 
−
==Tool Qualification==
 
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Every other week a light cleaning is performed on the tool. A 5 min etch with m_si_o_1 is performed on a 4" oxide wafer.  The results can be seen below.
 
−
 
 
−
{{#widget:Iframe
 
−
|url=https://docs.google.com/spreadsheets/d/1jDSV00jZ-1vppt2MgGRAJyXRvxEE3rJIlXtngODM9-0/pubchart?oid=1969686906&format=interactive
 
−
|width=800
 
−
|height=400
 
−
|border=0
 
−
}}
 

Latest revision as of 11:03, 28 October 2021

Plasmatherm 790
10030.jpg
Equipment Details
Technology RIE
Materials Restriction Metals
Material Processed Si, SiO2
Mask Materials PR, SiO2
Gases Used

Ar, CH4, CHF3, CF4,

H2, O2, SF6
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
User Processes User Processes


The Plasmatherm 790 is a dual chamber parallel plate tool. The left chamber is configured for reactive ion etching (RIE) while the right chamber is configured for plasma enhanced chemical vapor deposition (PECVD). The RIE chamber is significantly slower than other etchers available in the lab, allowing greater depth control on thin films. The PECVD chamber is also designed to deposit at a lower rate than the GSI PECVD and P5000 PECVD - the smaller building blocks help improve film quality. This tool has almost no material restrictions, allowing a wide variety of processing.


Capabilities

  • Wide variety of materials processed
  • Wide variety of gases available
  • Generally slower etch rates <1000 Å/min
  • Generally slow PECVD deposition rates <10 Å/sec

System Overview

Hardware Details

  • Pressure
    • RIE: 1 Torr Guage
    • PECVD: 2 Torr Gauge
  • Chuck
    • PECVD: Heated Platen: 200°C - 350°C
  • RF
    • 400 W 13.56 MHz RF Source

Substrate Requirements

  • RIE
    • Up to 3 100 mm (4") wafers
    • Pieces don't require mounting
  • PECVD
    • 1 150 mm (6") wafer
    • 2 100 mm (4") wafers
    • Several pieces

Material Restrictions

The Plasmatherm 790 is designated as a metals class tool. Below is a list of approved and restricted materials for the Plasmatherm 790. "Approved" means the material is allowed in the tool under normal circumstances. "Not Allowed" means the material may never be used in the tool. If a material is not listed, it may be possible to use the material under certain conditions. Please contact a tool engineer via the helpdesk ticket system for any material requests or questions.

Left Chamber

Right Chamber

The right chamber has the same restrictions as the left except polymers (such as photoresist) are not allowed unless their melting temperature is significantly higher than the process temperature (please create a helpdesk ticket for this).

Supported Processes

There are several processes for this tool supported by the LNF, which are described in more detail on the Processes page.

In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on LNF User:Plasmatherm 790 User Processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.

The latest PECVD qualification data is shown below.

Standard Operating Procedure

Checkout Procedure

  1. Read through the User Manual above.
  2. Accurately complete the SOP quiz. You may retake as necessary until all answers are correct.
  3. For RIE, complete the process request form.
  4. Create a helpdesk ticket requesting a checkout session.
  5. Authorization will be provided pending successful completion of the quiz and demonstration of proper tool use in the presence of a tool engineer.
Retrieved from "https://lnf-wiki.eecs.umich.edu/wiki/index.php?title=Plasmatherm_790&oldid=21158"