Plasmatherm 790/Processes/L ox350
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Revision as of 10:36, 28 October 2021 by Wrightsh (talk | contribs) (→Capabilities)
l_ox350 is a higher temp oxide deposition recipe for the Plasmatherm 790.
|About this Process|
|Gases Used||SiH4, N2O, He|
|Deposition Rate||44.5 nm/min|
|Index of Refraction||1.467|
Qualification is done with a 5 minute run, max allowed thickness of 2µm.
|RF Power||75 W|
|SiH4 Flow||3.0 sccm|
|N2O Flow||200 sccm|
|He Flow||100 sccm|