Difference between revisions of "Plasmatherm 790/Processes/L oxy350"

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l_on350 is a higher temp oxynitride deposition recipe for the [[Plasmatherm 790]].
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l_oxy350 is a higher temp oxynitride deposition recipe for the [[Plasmatherm 790]].
  
 
[[Category:Processes]]
 
[[Category:Processes]]
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| N<sub>2</sub> Flow
 
| N<sub>2</sub> Flow
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| 500 sccm
 
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| N<sub>2</sub>0 Flow
 
| N<sub>2</sub>0 Flow

Latest revision as of 11:52, 8 August 2019

l_oxy350 is a higher temp oxynitride deposition recipe for the Plasmatherm 790.

About this Process
Process Details
Equipment Plasmatherm 790
Technology PECVD
Material Oxynitride
Gases Used SiH4, N2O, He, NH3,



Parameters

Parameter Dep
RF Power 150 W
Pressure 1500 mTorr
SiH4 Flow 5.0 sccm
N2 Flow 500 sccm
N20 Flow 10 sccm
NH3 Flow 1.5 sccm
He Flow 490 sccm
Temperature 350°C

Capabilities

Parameter
Deposition Rate 6.9 Å/sec
Index of Refraction 1.63
Stress 60 MPa