Plasmatherm 790/Processes/L oxy350
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l_oxy350 is a higher temp oxynitride deposition recipe for the Plasmatherm 790.
| About this Process | |
|---|---|
| Process Details | |
| Equipment | Plasmatherm 790 |
| Technology | PECVD |
| Material | Oxynitride |
| Gases Used | SiH4, N2O, He, NH3, |
Parameters
| Parameter | Dep |
|---|---|
| RF Power | 150 W |
| Pressure | 1500 mTorr |
| SiH4 Flow | 5.0 sccm |
| N2 Flow | 500 sccm |
| N20 Flow | 10 sccm |
| NH3 Flow | 1.5 sccm |
| He Flow | 490 sccm |
| Temperature | 350°C |
Capabilities
| Parameter | |
|---|---|
| Deposition Rate | 6.9 Å/sec |
| Index of Refraction | 1.63 |
| Stress | 60 MPa |
