Difference between revisions of "RCA Bench 81"

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|maintenance = [[{{PAGENAME}}#Maintenance | Maintenance]]
 
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[[{{PAGENAME}}]] is used for [[RCA clean]]ing non-CMOS-clean samples. The RCA clean is a 3-stage method of cleaning Si wafers and is effective at removing organic and ionic surface contaminants.
 
[[{{PAGENAME}}]] is used for [[RCA clean]]ing non-CMOS-clean samples. The RCA clean is a 3-stage method of cleaning Si wafers and is effective at removing organic and ionic surface contaminants.
  
 
==Announcements==
 
==Announcements==
*Update this with announcements as necessary
 
  
 
==Capabilities==
 
==Capabilities==
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Revision as of 11:33, 15 September 2016

RCA Bench 81
171010.jpg
RCA 81
Equipment Details
Technology Wet bench
Materials Restriction Semi-Clean
Material Processed silicon, fused silica, glass
Sample Size 4" standard, some other sizes may be accommodated
Chemicals Used Ammonium hydroxide, Hydrogen peroxide, Hydrofluoric acid, Hydrochloric acid
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes RCA Clean
Maintenance Maintenance


RCA Bench 81 is used for RCA cleaning non-CMOS-clean samples. The RCA clean is a 3-stage method of cleaning Si wafers and is effective at removing organic and ionic surface contaminants.

Announcements

Capabilities

This wet bench is used for RCA cleaning samples which 1) do not need to go into the furnaces, or 2) have been been through the non-CMOS-clean processes of chemical mechanical polishing, KOH etch, or AZ 400K developer, and which need to go back into furnaces.

System Overview

Chemicals Used

Hardware Details

This bench contains a heated tank for RCA SC-1, a heated tank for RCA SC-2, and an unheated tank for dilute HF.

Substrate Requirements

  • Wafer Size: 4" standard, some other sizes may be accommodated
  • Wafer type: silicon, fused silica, and glass allowed

Safety

Proper PPE for this bench are Trionic gloves, face shield, apron and safety glasses
Warning Warning: You must use the buddy system for all chemical processing. No processing if you are alone in the lab. If the yellow warning lights are on it means that there are 2 or 1 people in the lab.

Working with chemicals can be very dangerous. To minimize the chance of accident, make sure you always:

  • Wear personal protective equipment.
  • Know the properties and hazards of chemicals you are working with. If you don’t know, find out by reading about them or asking staff.
  • Plan the details of your process. Before you start working, plan what quantities of chemicals and sample carriers you will use. Plan how you will rinse your sample and what you will do with any waste generated. Make sure you know how the controllers work.
  • Do not use this bench without proper training.
  • There is one route of waste disposal from this bench: .
    • Water aspirator: Only water, acids and bases can be disposed of using this aspirator. Do not aspirate solvents with this aspirator.

Material Restrictions

Silicon, fused silica, and glass substrates are allowed in the bench. Metals, compound semiconductors, and polymers are not allowed.

The RCA Bench 81 is designated as a Semi-Clean class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

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Standard Operating Procedure

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Checkout procedure

  1. Take the General Wet Bench Training, if you haven't already.
  2. Read through this page and the Standard Operating Procedure above.
  3. Practice with your mentor or another authorized user until you are comfortable with tool operation.
  4. Create a Helpdesk ticket requesting checkout.
  5. A tool engineer will schedule a time for checkout.