Difference between revisions of "SPR 220"

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{| class="wikitable" border="1"
 
{| class="wikitable" border="1"
 
! rowspan="2"|Photoresist Spin Speed
 
! rowspan="2"|Photoresist Spin Speed
! colspan="2"|SPR 220 (3.0)
 
 
! colspan="2"|SPR 220 (7.0)
 
! colspan="2"|SPR 220 (7.0)
 
|-
 
|-
 
! Thickness
 
! Thickness
 
! [[CEE Developer 1|CEE Developer Recipe]]
 
! [[CEE Developer 1|CEE Developer Recipe]]
 +
|-
 +
| 875 rpm
 +
| 5.0 μm
 +
| 80-80 DP
 +
|-
 +
| 1000 rpm
 +
| 5.0 μm
 +
| 70-70 DP
 +
|-
 +
| 2000 rpm
 +
| 5.0 μm
 +
| 40-40 DP
 +
|-
 +
| 3000 rpm
 +
| 5.0 μm
 +
| 30-30 DP
 +
|-
 +
| 4000 rpm
 +
| 5.0 μm
 +
| 60 SP
 +
|-
 +
| 5000 rpm
 +
| 5.0 μm
 +
| 60 SP
 +
|}
 +
{| class="wikitable" border="1"
 +
! rowspan="2"|Photoresist Spin Speed
 +
! colspan="2"|SPR 220 (3.0)
 +
|-
 
! Thickness
 
! Thickness
 
! [[CEE Developer 1|CEE Developer Recipe]]
 
! [[CEE Developer 1|CEE Developer Recipe]]
 +
 
|-
 
|-
 
| 875 rpm
 
| 875 rpm
 
| 5.0 μm
 
| 5.0 μm
 
| 80-80 DP
 
| 80-80 DP
| 5.0 μm
+
 
| 80-80 DP
 
 
|-
 
|-
 
| 1000 rpm
 
| 1000 rpm
| 5.0 μm
 
| 70-70 DP
 
 
| 5.0 μm
 
| 5.0 μm
 
| 70-70 DP
 
| 70-70 DP
Line 36: Line 62:
 
| 2000 rpm
 
| 2000 rpm
 
| 4.0 μm
 
| 4.0 μm
| 40-40 DP
 
| 5.0 μm
 
 
| 40-40 DP
 
| 40-40 DP
 
|-
 
|-
 
| 3000 rpm
 
| 3000 rpm
 
| 3.25 μm
 
| 3.25 μm
| 30-30 DP
 
| 5.0 μm
 
 
| 30-30 DP
 
| 30-30 DP
 
|-
 
|-
 
| 4000 rpm
 
| 4000 rpm
 
| 2.75 μm
 
| 2.75 μm
| 60 SP
 
| 5.0 μm
 
 
| 60 SP
 
| 60 SP
 
|-
 
|-
 
| 5000 rpm
 
| 5000 rpm
 
| 2.6 μm
 
| 2.6 μm
| 60 SP
 
| 5.0 μm
 
 
| 60 SP
 
| 60 SP
 
|}
 
|}

Revision as of 12:02, 1 March 2017

Warning Warning: This page has not been released yet.

SPR 220 is a photoresist used for XYZ

Processes

  • There are currently no processes defined that use this chemical.

Exposure

Post Exposure Bake

115C 90s contact hot plate

Develop

Photoresist Spin Speed SPR 220 (7.0)
Thickness CEE Developer Recipe
875 rpm 5.0 μm 80-80 DP
1000 rpm 5.0 μm 70-70 DP
2000 rpm 5.0 μm 40-40 DP
3000 rpm 5.0 μm 30-30 DP
4000 rpm 5.0 μm 60 SP
5000 rpm 5.0 μm 60 SP
Photoresist Spin Speed SPR 220 (3.0)
Thickness CEE Developer Recipe
875 rpm 5.0 μm 80-80 DP
1000 rpm 5.0 μm 70-70 DP
2000 rpm 4.0 μm 40-40 DP
3000 rpm 3.25 μm 30-30 DP
4000 rpm 2.75 μm 60 SP
5000 rpm 2.6 μm 60 SP

Process SOPs

  • There are currently no process SOPs defined for this chemical.

Equipment

  • There are currently no equipment defined that use this chemical.

Technical Data Sheet

  • There are currently no data sheets for this chemical.

Safety Data Sheet

  • There are currently no Safety Data Sheets (SDSes) for this chemical.

References

  • Other links that are useful