Difference between revisions of "SPR 220"
Jump to navigation
Jump to search
| Line 14: | Line 14: | ||
{| class="wikitable" border="1" | {| class="wikitable" border="1" | ||
! rowspan="2"|Photoresist Spin Speed | ! rowspan="2"|Photoresist Spin Speed | ||
| − | ! colspan="2"|SPR 220 ( | + | ! colspan="2"|SPR 220 (3.0) |
|- | |- | ||
! Thickness | ! Thickness | ||
! [[CEE Developer 1|CEE Developer Recipe]] | ! [[CEE Developer 1|CEE Developer Recipe]] | ||
| + | ![[ACS 200 cluster tool]] | ||
|- | |- | ||
| 875 rpm | | 875 rpm | ||
| 5.0 μm | | 5.0 μm | ||
| 80-80 DP | | 80-80 DP | ||
| + | |MF300 dev 50s | ||
|- | |- | ||
| 1000 rpm | | 1000 rpm | ||
| − | | | + | |4.7 μm |
| 70-70 DP | | 70-70 DP | ||
| + | |MF300 dev 50s | ||
|- | |- | ||
| 2000 rpm | | 2000 rpm | ||
| − | | | + | | 4.0 μm |
| 40-40 DP | | 40-40 DP | ||
| + | |MF300 dev 40s | ||
|- | |- | ||
| 3000 rpm | | 3000 rpm | ||
| − | | | + | | 3.25 μm |
| 30-30 DP | | 30-30 DP | ||
| + | |MF300 dev 40s | ||
|- | |- | ||
| 4000 rpm | | 4000 rpm | ||
| − | | | + | | 2.75 μm |
| 60 SP | | 60 SP | ||
| + | |MF300 dev 40s | ||
|- | |- | ||
| 5000 rpm | | 5000 rpm | ||
| − | | | + | | 2.6 μm |
| 60 SP | | 60 SP | ||
| + | |MF300 dev 30s | ||
|} | |} | ||
{| class="wikitable" border="1" | {| class="wikitable" border="1" | ||
! rowspan="2"|Photoresist Spin Speed | ! rowspan="2"|Photoresist Spin Speed | ||
| − | ! colspan="2"|SPR 220 ( | + | ! colspan="2"|SPR 220 (7.0) |
|- | |- | ||
! Thickness | ! Thickness | ||
! [[CEE Developer 1|CEE Developer Recipe]] | ! [[CEE Developer 1|CEE Developer Recipe]] | ||
| − | |||
|- | |- | ||
| 875 rpm | | 875 rpm | ||
| 5.0 μm | | 5.0 μm | ||
| 80-80 DP | | 80-80 DP | ||
| − | |||
|- | |- | ||
| 1000 rpm | | 1000 rpm | ||
| Line 61: | Line 66: | ||
|- | |- | ||
| 2000 rpm | | 2000 rpm | ||
| − | | | + | | 5.0 μm |
| 40-40 DP | | 40-40 DP | ||
|- | |- | ||
| 3000 rpm | | 3000 rpm | ||
| − | | | + | | 5.0 μm |
| 30-30 DP | | 30-30 DP | ||
|- | |- | ||
| 4000 rpm | | 4000 rpm | ||
| − | | | + | | 5.0 μm |
| 60 SP | | 60 SP | ||
|- | |- | ||
| 5000 rpm | | 5000 rpm | ||
| − | | | + | | 5.0 μm |
| 60 SP | | 60 SP | ||
|} | |} | ||
Revision as of 12:06, 1 March 2017
 Warning: | This page has not been released yet. |
SPR 220 is a photoresist used for XYZ
Contents
Processes
- There are currently no processes defined that use this chemical.
Exposure
Post Exposure Bake
115C 90s contact hot plate
Develop
| Photoresist Spin Speed | SPR 220 (3.0) | ||
|---|---|---|---|
| Thickness | CEE Developer Recipe | ACS 200 cluster tool | |
| 875 rpm | 5.0 μm | 80-80 DP | MF300 dev 50s |
| 1000 rpm | 4.7 μm | 70-70 DP | MF300 dev 50s |
| 2000 rpm | 4.0 μm | 40-40 DP | MF300 dev 40s |
| 3000 rpm | 3.25 μm | 30-30 DP | MF300 dev 40s |
| 4000 rpm | 2.75 μm | 60 SP | MF300 dev 40s |
| 5000 rpm | 2.6 μm | 60 SP | MF300 dev 30s |
| Photoresist Spin Speed | SPR 220 (7.0) | |
|---|---|---|
| Thickness | CEE Developer Recipe | |
| 875 rpm | 5.0 μm | 80-80 DP |
| 1000 rpm | 5.0 μm | 70-70 DP |
| 2000 rpm | 5.0 μm | 40-40 DP |
| 3000 rpm | 5.0 μm | 30-30 DP |
| 4000 rpm | 5.0 μm | 60 SP |
| 5000 rpm | 5.0 μm | 60 SP |
Process SOPs
- There are currently no process SOPs defined for this chemical.
Equipment
- There are currently no equipment defined that use this chemical.
Technical Data Sheet
- There are currently no data sheets for this chemical.
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
References
- Other links that are useful
