Difference between revisions of "SPR 220"

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Line 28: Line 28:
 
| 875 rpm
 
| 875 rpm
 
| 5.0 μm
 
| 5.0 μm
|
+
|0.35s - 0.5s
|
+
| 10s - 13s
 
| 80-80 DP
 
| 80-80 DP
 
|MF300 dev 50s
 
|MF300 dev 50s
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| 1000 rpm
 
| 1000 rpm
 
|4.7 μm
 
|4.7 μm
|
+
|0.35s - 0.45s
|
+
| 10s - 12s
 
| 70-70 DP
 
| 70-70 DP
 
|MF300 dev 50s
 
|MF300 dev 50s

Revision as of 11:11, 2 March 2017

Warning Warning: This page has not been released yet.

SPR 220 is a photoresist used for XYZ

Processes

  • There are currently no processes defined that use this chemical.

Exposure

Post Exposure Bake

115C 90s contact hot plate

Develop

SPR 220 (3.0)
Photoresist Spin Speed Exposure Develop
Thickness GCA AS200 AutoStep Contact Lithography CEE Developer Recipe ACS 200 Recipe
875 rpm 5.0 μm 0.35s - 0.5s 10s - 13s 80-80 DP MF300 dev 50s
1000 rpm 4.7 μm 0.35s - 0.45s 10s - 12s 70-70 DP MF300 dev 50s
2000 rpm 4.0 μm 40-40 DP MF300 dev 40s
3000 rpm 3.25 μm 0.25s - 3.5s 5.5s - 7s 30-30 DP MF300 dev 40s
4000 rpm 2.75 μm .20 - .30s 4.5s - 6.5s 60 SP MF300 dev 40s
5000 rpm 2.6 μm .20s - 0.3s 4.0 - 6.0s 60 SP MF300 dev 30s
Photoresist Spin Speed SPR 220 (7.0)
Thickness CEE Developer Recipe
875 rpm 5.0 μm 80-80 DP
1000 rpm 5.0 μm 70-70 DP
2000 rpm 5.0 μm 40-40 DP
3000 rpm 5.0 μm 30-30 DP
4000 rpm 5.0 μm 60 SP
5000 rpm 5.0 μm 60 SP

Process SOPs

  • There are currently no process SOPs defined for this chemical.

Equipment

  • There are currently no equipment defined that use this chemical.

Technical Data Sheet

  • There are currently no data sheets for this chemical.

Safety Data Sheet

  • There are currently no Safety Data Sheets (SDSes) for this chemical.

References

  • Other links that are useful