Difference between revisions of "SPR 220"

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====Stepper====
 
====Stepper====
 
Gratings
 
Gratings
[[File:SPR220_3um_stepper_grating_silicon.jpg|1200px]]
+
[[File:SPR220_3um_stepper_grating_silicon.jpg|1000px]]
[[File:SPR220_3um_stepper_grating_aluminum.jpg|800px]]
+
[[File:SPR220_3um_stepper_grating_aluminum.jpg|1000px]]
 
[[File:SPR220_3um_stepper_grating_low_reflection.jpg|1000px]]
 
[[File:SPR220_3um_stepper_grating_low_reflection.jpg|1000px]]
  
 
Trenches
 
Trenches
[[File:SPR220_3um_stepper_trench_1um.jpg|thumbnail]]
+
[[File:SPR220_3um_stepper_trench_1um.jpg|1000px]]
[[File:SPR220_3um_stepper_trench_700nm.jpg|thumbnail]]
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[[File:SPR220_3um_stepper_trench_700nm.jpg|1000px]]
 
====Contact Aligner====
 
====Contact Aligner====
  

Revision as of 18:13, 11 September 2018

Warning Warning: This page has not been released yet.

SPR 220 is our most commonly used photoresist, especially for RIE.


3µm - SPR 220 (3.0)

Process

  1. Dehydrate and apply HMDS
  2. Spin
  3. Bake 115°C for 90sec
  4. Wait 5 min
  5. Expose
    • Stepper
      • Silicon - 0.40 sec
      • Aluminum (high reflection) - XXX
      • Low Reflection - 0.42 sec
    • Aligner - 7 sec
  1. Wait 5 min
  2. Bake 115°C for 90sec
  3. Develop
    • ACS - AZ300 - 30sec
    • CEE - AZ726 30-30DP

Characterization

Stepper

Gratings SPR220 3um stepper grating silicon.jpg SPR220 3um stepper grating aluminum.jpg SPR220 3um stepper grating low reflection.jpg

Trenches SPR220 3um stepper trench 1um.jpg SPR220 3um stepper trench 700nm.jpg

Contact Aligner

5µm of SPR 220 (3.0)

Equipment

  • There are currently no equipment defined that use this chemical.

Technical Data Sheet

Safety Data Sheet

  • There are currently no Safety Data Sheets (SDSes) for this chemical.

References