Difference between revisions of "SPR 220"
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===Characterization=== | ===Characterization=== | ||
====Stepper==== | ====Stepper==== | ||
| − | Gratings | + | Gratings with equal duty cycle. |
[[File:SPR220_3um_stepper_grating_silicon.jpg|1000px]] | [[File:SPR220_3um_stepper_grating_silicon.jpg|1000px]] | ||
| Line 34: | Line 34: | ||
[[File:SPR220_3um_stepper_grating_low_reflection.jpg|1000px]] | [[File:SPR220_3um_stepper_grating_low_reflection.jpg|1000px]] | ||
| − | + | Free standing trenches. | |
[[File:SPR220_3um_stepper_trench_1um.jpg|1000px]] | [[File:SPR220_3um_stepper_trench_1um.jpg|1000px]] | ||
Revision as of 18:14, 11 September 2018
 Warning: | This page has not been released yet. |
SPR 220 is our most commonly used photoresist, especially for RIE.
Contents
3µm - SPR 220 (3.0)
Process
- Dehydrate and apply HMDS
- Spin
- Bake 115°C for 90sec
- Wait 5 min
- Expose
- Stepper
- Silicon - 0.40 sec
- Aluminum (high reflection) - XXX
- Low Reflection - 0.42 sec
- Aligner - 7 sec
- Stepper
- Wait 5 min
- Bake 115°C for 90sec
- Develop
- ACS - AZ300 - 30sec
- CEE - AZ726 30-30DP
Characterization
Stepper
Gratings with equal duty cycle.
Free standing trenches.
Contact Aligner
5µm of SPR 220 (3.0)
Equipment
- There are currently no equipment defined that use this chemical.
Technical Data Sheet
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
