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SPR 220 is a photoresist used for XYZ
Processes
- There are currently no processes defined that use this chemical.
Exposure
Post Exposure Bake
115C 90s contact hot plate
Develop
| Photoresist Spin Speed
|
SPR 220 (3.0)
|
SPR 220 (7.0)
|
| Thickness
|
CEE Developer Recipe
|
Thickness
|
CEE Developer Recipe
|
| 875 rpm
|
5.0 μm
|
80-80 DP
|
5.0 μm
|
80-80 DP
|
| 1000 rpm
|
5.0 μm
|
70-70 DP
|
5.0 μm
|
70-70 DP
|
| 2000 rpm
|
4.0 μm
|
40-40 DP
|
5.0 μm
|
40-40 DP
|
| 3000 rpm
|
3.25 μm
|
30-30 DP
|
5.0 μm
|
30-30 DP
|
| 4000 rpm
|
2.75 μm
|
60 SP
|
5.0 μm
|
60 SP
|
| 5000 rpm
|
2.6 μm
|
60 SP
|
5.0 μm
|
60 SP
|
Process SOPs
- There are currently no process SOPs defined for this chemical.
Equipment
- There are currently no equipment defined that use this chemical.
Technical Data Sheet
- There are currently no data sheets for this chemical.
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
References
- Other links that are useful
