SPR 220
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SPR 220 is a photoresist used for XYZ
Contents
Processes
- There are currently no processes defined that use this chemical.
Exposure
Post Exposure Bake
115C 90s contact hot plate
Develop
| SPR 220 (3.0) | ||||||
|---|---|---|---|---|---|---|
| Photoresist Spin Speed | Exposure | Develop | ||||
| Thickness | GCA AS200 AutoStep | Contact Lithography | CEE Developer Recipe | ACS 200 Recipe | ||
| 875 rpm | 5.0 μm | 80-80 DP | MF300 dev 50s | |||
| 1000 rpm | 4.7 μm | 70-70 DP | MF300 dev 50s | |||
| 2000 rpm | 4.0 μm | 40-40 DP | MF300 dev 40s | |||
| 3000 rpm | 3.25 μm | 30-30 DP | MF300 dev 40s | |||
| 4000 rpm | 2.75 μm | 60 SP | MF300 dev 40s | |||
| 5000 rpm | 2.6 μm | 60 SP | MF300 dev 30s | |||
| Photoresist Spin Speed | SPR 220 (7.0) | |
|---|---|---|
| Thickness | CEE Developer Recipe | |
| 875 rpm | 5.0 μm | 80-80 DP |
| 1000 rpm | 5.0 μm | 70-70 DP |
| 2000 rpm | 5.0 μm | 40-40 DP |
| 3000 rpm | 5.0 μm | 30-30 DP |
| 4000 rpm | 5.0 μm | 60 SP |
| 5000 rpm | 5.0 μm | 60 SP |
Process SOPs
- There are currently no process SOPs defined for this chemical.
Equipment
- There are currently no equipment defined that use this chemical.
Technical Data Sheet
- There are currently no data sheets for this chemical.
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
References
- Other links that are useful
