SPR 220

From LNF Wiki
Jump to navigation Jump to search

SPR 220 is our most commonly used photoresist, especially for RIE. The lab stocks SPR 220 (3.0) for general use, in the ACS 200 Cluster Tool, and in the CEE 200X #1 & #2. For films thicker then 5µm SPR 220 (7.0) is also available from the LNF Store.


3µm - SPR 220 (3.0)

Process

  1. Dehydrate and apply HMDS
  2. Spin
    • ACS - SPR 220 3.0 3um recipe
    • CEE 2OOX PR Spinner 1,2 - SPR 220 3.0 3um recipe
  3. Bake 115°C for 90 sec
  4. Wait ≥5 min
  5. Expose
    • Stepper
      • Silicon - 0.40 sec
      • Aluminum (~90% reflection) - 0.34 sec
      • ~15% reflection - 0.42 sec
    • Aligner - 7 sec (silicon)
  6. Wait ≥3 min
  7. Bake 115°C for 90 sec
  8. Develop
    • ACS - AZ300 - 30 sec
    • CEE - AZ726 30-30 DP

Characterization

Stepper

Minimum Feature Size
Grating 700 nm
Line ??
Trench 1 µm
Hole ??
Pillar ?? nm

Gratings with equal duty cycle.

SPR220 3um stepper grating silicon.jpg SPR220 3um stepper grating aluminum.jpg

Free standing trenches.

SPR220 3um stepper trench 1um.jpg SPR220 3um stepper trench 700nm.jpg

Free standing lines.

  1. TODO

Holes

  1. TODO

Pillars

  1. TODO

Focus should be kept at 0.

SPR220 3um stepper focus.jpg

Puddle vs Spray Develop

  1. TODO

Spray develop time: SPR220 3um develop time.jpg

Contact Aligner

~2µm minimum feature size, but this is partially limited by the mask maker.

SPR220 3um aligner grating silicon.jpg

5µm of SPR 220 (3.0)

Process

  1. Dehydrate and apply HMDS
  2. Spin
    • ACS 200 Cluster Tool - SPR 220 3.0 5um recipe
    • CEE 200X PR Spinner 1,2 - SPR 220 3.0 5um recipe
  3. Bake 2 minutes (120 seconds) at 115°C with a 30 second stepdown
  4. Wait ≥ ?? min
  5. Expose
    • Stepper
      • Silicon - 0.75 seconds
      • Aluminum (~90% reflection) - ??
      • ~15% reflection - ??
    • Aligner -11 sec (silicon)
  6. Wait ≥ ?? min
  7. Bake 115°C for 90 sec
  8. Develop
    • ACS - AZ300 - ?? sec
    • CEE - AZ726 ??

Characterization

Stepper

Contact Aligner

10µm - SPR 220 (7.0)

SPR 220 7.0 process and development information can be found on the SPR 220 7.0 page.

Technical Data Sheet