Difference between revisions of "SPR 220 7.0"

Revision as of 10:04, 16 March 2020

SPR 220 is our most commonly used photoresist, especially for RIE. The lab stocks SPR 220 (3.0) for general use, in the ACS 200 cluster tool, and in the CEE 200X photoresist spinner 2. For films thicker then 5µm SPR 220 (7.0) is also available from the LNF Store and in the CEE 200X photoresist spinner 1.

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−	SPR 220 is our most commonly used photoresist, especially for RIE. The lab stocks [[SPR 220 (3.0)]] for general use, in the [[ACS 200 cluster tool]], and in the [[CEE 200X photoresist spinner 1] & [[CEE 200X photoresist spinner 2]]. For films thicker then 5µm SPR 220 (7.0) is also available from the LNF Store and in the [[CEE 200X photoresist spinner 1]].	+	SPR 220 is our most commonly used photoresist, especially for RIE. The lab stocks [[SPR 220]] (3.0) for general use, in the [[ACS 200 cluster tool]], and in the [[CEE 200X photoresist spinner 1] & [[CEE 200X photoresist spinner 2]]. For films thicker then 5µm SPR 220 (7.0) is also available from the LNF Store and in the [[CEE 200X photoresist spinner 1]].