SPR 220 7.0

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SPR 220 is our most commonly used photoresist, especially for RIE. The lab stocks SPR 220 (3.0) for general use, in the ACS 200 cluster tool, and in the CEE 200X photoresist spinner 2. For films thicker then 5µm SPR 220 (7.0) is also available from the LNF Store and in the CEE 200X photoresist spinner 1.

Process

  1. Dehydrate and apply HMDS
  2. Spin on ACS at 2000 RPM or on CEE 200X PR Spinner #1 using the recipe SPR 220 7.0 10 um
  3. Bake
    • ACS Hotplate - 6 minutes (360 seconds) at 115°C with a 30 second stepdown
    • Let sample cool in a cassette or somewhere it can cool slowly. NOT on cold metal table.
  4. Wait ≥ 20 min
  5. Expose
    • Stepper
      • Silicon - ??
      • Aluminum (~90% reflection) - ??
      • ~15% reflection - ??
    • Aligner -26 sec (silicon)
  6. Wait ≥60 min
  7. Bake 115°C for ??
    • Let sample cool in a cassette or somewhere it can cool slowly. NOT on cold metal table.
  8. Develop
    • ACS - AZ300 - 60 sec
    • CEE - AZ726 DP 80-80 sec