Difference between revisions of "SPR 955"
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#* [[ACS 200 cluster tool]] - MF 300 for 17 sec | #* [[ACS 200 cluster tool]] - MF 300 for 17 sec | ||
#* [[CEE Developer 1|CEE Developer]] - 25 sec single puddle | #* [[CEE Developer 1|CEE Developer]] - 25 sec single puddle | ||
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| + | ==Spin Curve== | ||
| + | {{note|The following spin curve is for the [[CEE 100CB photoresist spinner]]. For other spinners, please measure the thickness before processing.}} | ||
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| + | {{#widget:Iframe | ||
| + | |url=https://docs.google.com/spreadsheets/d/1Hs1zh7CiqTpL_PiFv8Z67KeZ3CHS2DDKGT282LUjyTA/pubchart?oid=470919386&format=interactive | ||
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==Technical Data Sheet== | ==Technical Data Sheet== | ||
Revision as of 20:18, 26 April 2016
 Warning: | This page has not been released yet. |
SPR 955 is an I-line series of photoresists developed by microchem.
Processes
SPR 955 (0.9)
- Vapor prime wafer with HMDS
- Spin at 3,000 RPM
- ACS 200 cluster tool - 1.0 sec 20 psi dispense
- Bake at 100°C for 60 sec
- Expose
- GCA AS200 AutoStep - 0.27 sec, standard focus
- Contact Aligner - 5 sec
- Bake at 110°C for 60 sec
- Develop
- ACS 200 cluster tool - MF 300 for 17 sec
- CEE Developer - 25 sec single puddle
Spin Curve
The following spin curve is for the CEE 100CB photoresist spinner. For other spinners, please measure the thickness before processing.
Technical Data Sheet
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
