Difference between revisions of "SPR 955"

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==Process Curves==
==Process Curves==
This is a sample spin curve made with the CEE 100CB, it is recommended to measure your actual thickness.
{{note|The following spin curve is for the [[CEE 100CB photoresist spinner]]. For other spinners, please measure the thickness before processing.}}

Revision as of 12:29, 2 May 2018

SPR 955 is an I-line series of photoresists developed by microchem, it's similar to SPR 220 but is formulated for thinner viscosities and higher resolution. We've been able to get 500nm gratings in 0.97µm of SPR 955 in the stepper, on silicon. This thickness was chosen because it's one of the peaks listed in the datasheets swing curve.


SPR 955 (0.9)

These gratings are on silicon and exposed via the stepper.

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  1. Vapor prime wafer with HMDS
  2. Spin 0.97µm in ACS
    • Verify thickness, for thin resists small thickness variations drastically change the necessary exposure dose.
  3. Bake at 100°C for 90 sec
  4. Expose
  5. Bake at 110°C for 90 sec
  6. Develop

Process Curves

SPR 955 0.97µm CD Loss vs Exposure.png

Technical Data Sheet

SPR 955 Datasheet

Safety Data Sheet

  • There are currently no Safety Data Sheets (SDSes) for this chemical.