Difference between revisions of "SPR 955"
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[[File:SPR_955_0.97µm_CD_Loss_vs_Exposure.png|450px]] | [[File:SPR_955_0.97µm_CD_Loss_vs_Exposure.png|450px]] | ||
Revision as of 12:29, 2 May 2018
SPR 955 is an I-line series of photoresists developed by microchem, it's similar to SPR 220 but is formulated for thinner viscosities and higher resolution. We've been able to get 500nm gratings in 0.97µm of SPR 955 in the stepper, on silicon. This thickness was chosen because it's one of the peaks listed in the datasheets swing curve.
Processes
SPR 955 (0.9)
These gratings are on silicon and exposed via the stepper.
- Vapor prime wafer with HMDS
- Spin 0.97µm in ACS
- Verify thickness, for thin resists small thickness variations drastically change the necessary exposure dose.
- Bake at 100°C for 90 sec
- Expose
- GCA AS200 AutoStep - 0.3sec, standard focus
- Contact Aligner - 5 sec
- Bake at 110°C for 90 sec
- Develop
- ACS 200 cluster tool - MF 300 for 17 sec
- CEE Developer - 25 sec single puddle
Process Curves
Technical Data Sheet
Safety Data Sheet
- There are currently no Safety Data Sheets (SDSes) for this chemical.
