Difference between revisions of "Silicon"
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| Line 24: | Line 24: | ||
*Deposition | *Deposition | ||
**[[Lab 18-1]] | **[[Lab 18-1]] | ||
| + | **[[Tempress S1T3 - P-type in Situ Doped Poly-Si 4”]] | ||
| + | **[[Tempress S1T3 - N-type in Situ Doped Poly-Si 6”]] | ||
| + | **[[Tempress S3T3 - Flat Poly-Si 4”]] | ||
| + | **[[Tempress S6T3 - Flat Poly-Si 4”]] | ||
===Processes=== | ===Processes=== | ||
Revision as of 14:03, 21 September 2017
 Warning: | This page has not been released yet. |
| Silicon | |
|---|---|
| Material Details | |
| Material Restriction | Undefined |
A description & relevant information for this material need to be added.
Applications
Discuss common uses/applications for this material.
Processing Tools
Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.
Equipment
- Etching
- Deposition
Processes
- List of chemical (or otherwise) processes for this material
