Silicon

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Silicon
Material Details
Material Restriction Undefined



A description & relevant information for this material need to be added.

Applications

Discuss common uses/applications for this material.

Processing Tools

Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.

Equipment

Poly silicon

Doped Poly silicon

Poly silicon

Tempress S1T3 - N-type in Situ Doped Poly-Si 6"

The Tempress S1T3 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the LPCVD process to deposit n-type doped poly-silicon.

Tempress S3T3 - Flat Poly-Si 4"

The Tempress S3T3 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the LPCVD process to deposit poly-silicon, annealed poly-silicon and amorphous silicon.

Tempress S6T3 - Flat Poly-Si 4"

The Tempress S6T3 furnace tube is a metals allowed, modular, horizontal furnace tube that uses the LPCVD process to deposit poly-silicon, annealed poly-silicon, and amorphous silicon.

Doped Poly silicon

Tempress S3T4 - N-type in Situ Doped Poly-Si 4"

The Tempress S3T4 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the LPCVD process to deposit n-type doped poly-silicon.

Tempress S4T3 - P-type in Situ Doped Poly-Si 4"

The Tempress S4T3 furnace tube is a CMOS clean, modular, horizontal furnace tube that uses the LPCVD process to deposit p-type doped poly-silicon.


Processes

  • List of chemical (or otherwise) processes for this material

References

Wikipedia Page