Difference between revisions of "Silicon dioxide"

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===Processes===
 
===Processes===
 +
* [[Chemical vapor deposition|Chemical Vapor Deposition (CVD)]]
 +
**[[Atomic_layer_deposition|Atomic Layer Deposition (ALD)]]
 +
**[[Low_pressure_chemical_vapor_deposition|Low-Pressure Chemical Vapor Deposition (LPCVD)]]
 +
**[[Parylene_deposition|Parylene deposition]]
 +
**[[PECVD|Plasma Enhanced Chemical Vapor Deposition (PECVD)]]
 +
 +
* [[Physical vapor deposition]] (PVD)
 +
**[[Electron_beam_evaporation|E-beam evaporation]]
 +
**[[Sputter_deposition|Sputter deposition]
  
 
====Deposition Processes====
 
====Deposition Processes====

Revision as of 08:10, 10 July 2019

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Description

A description & relevant information for this material need to be added.

Processing Tools

Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.

Equipment

Processes