Difference between revisions of "Solitec Spinner"
| Line 33: | Line 33: | ||
==System overview== | ==System overview== | ||
===Hardware details=== | ===Hardware details=== | ||
| − | The Solitec Spinner has a mechanical vacuum pump to provide vacuum to the sample chuck to hold the sample in place during spinning. It spins in two stages to allow a slower | + | The Solitec Spinner has a mechanical vacuum pump to provide vacuum to the sample chuck to hold the sample in place during spinning. It spins in two stages, to allow first a slower speed for the liquid to spread, and secondly, a faster final spin speed which determines the final film thickness. |
===Substrate requirements=== | ===Substrate requirements=== | ||
Revision as of 14:48, 26 September 2016
| Solitec Spinner | |
|---|---|
 | |
| Equipment Details | |
| Technology | Lithography |
| Materials Restriction | Metals |
| Sample Size | sample sizes up to 6" diameter |
| Chemicals Used | photoresists, polyimides, PDMS, others with approval |
| Equipment Manual | |
| Overview | System Overview |
| Operating Procedure | SOP |
| Supported Processes | Supported Processes |
| User Processes | User Processes |
| Maintenance | Maintenance |
 Warning: | This page has not been released yet. |
The Solitec Spinner is a manual photoresist spinner located in the ROBIN lab. It is used primarily for soft lithography, and is interlocked with Solvent Bench 94. Solvent Bench 94 must be reserved in order to use the Solitec Spinner.
Contents
Announcements
- Update this with announcements as necessary
Capabilities
The Solitec Spinner is a manual, two-stage spinner which can spin at speeds up to 7000 rpm. It can be used to spin photoresists and other liquids to achieve thin layers of varying thickness.
System overview
Hardware details
The Solitec Spinner has a mechanical vacuum pump to provide vacuum to the sample chuck to hold the sample in place during spinning. It spins in two stages, to allow first a slower speed for the liquid to spread, and secondly, a faster final spin speed which determines the final film thickness.
Substrate requirements
Several sizes of vacuum chuck (for 0.5", 1", 4" & 6" diameter samples) are available. Substrates of varying shape and material, up to 6" diameter, can be accommodated, subject to their weight and the strength of the chuck vacuum.
Material restrictions
The Solitec Spinner is a Metals class tool. Since it is interlocked and used in conjunction with Solvent Bench 94, it has the same substrate and thin film materials restrictions as Solvent Bench 94. However, chemicals allowed to be spun may differ from those allowed to be processed in Solvent 94.
Supported processes
There are several processes for the Solitec Spinner and Solvent Bench 94 which are supported by the LNF. These are described in more detail on the Solvent Bench 94 Processes page.
Standard operating procedure
Widget text will go here.
Checkout procedure
- Read through this page and the Standard Operating Procedure above.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Schedule a checkout session with a tool engineer via the Helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
Maintenance
The Solitec bowl is lined with Al foil and the foil is changed regularly during lab clean. This is necessary because the primary photoresist used in this spinner is SU-8, which is not soluble in most solvents. Chuck vacuum is monitored regularly.
