|Sample Size||sample sizes up to 6" diameter|
|Chemicals Used||photoresists, polyimides, PDMS, others with approval|
|Supported Processes||Supported Processes|
|User Processes||User Processes|
|Warning:||This page has not been released yet.|
The Solitec Spinner is a manual photoresist spinner located in the ROBIN lab. It is used primarily for soft lithography, and is interlocked with Solvent Bench 94. Solvent Bench 94 must be reserved in order to use the Solitec Spinner.
- Update this with announcements as necessary
The Solitec Spinner is a manual, two-stage spinner which can spin at speeds up to 7000 rpm. It can be used to spin photoresists and other liquids to achieve thin layers of varying thickness.
The Solitec Spinner has a mechanical vacuum pump to provide vacuum to the sample chuck to hold the sample in place during spinning. It spins in two stages, to allow first a slower speed for the liquid to spread, and secondly, a faster final spin speed which determines the final film thickness.
Several sizes of vacuum chuck (for 0.5", 1", 4" & 6" diameter samples) are available. Substrates of varying shape and material, up to 6" diameter, can be accommodated, subject to their weight and the strength of the chuck vacuum.
The Solitec Spinner is a Metals class tool. Since it is interlocked and used in conjunction with Solvent Bench 94, it has the same substrate and thin film materials restrictions as Solvent Bench 94. However, chemicals allowed to be spun may differ from those allowed to be processed in Solvent 94.
Standard operating procedure
Widget text will go here.
- Read through this page and the Standard Operating Procedure above.
- Practice with your mentor or another authorized user until you are comfortable with tool operation.
- Schedule a checkout session with a tool engineer via the Helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.
The Solitec bowl is lined with Al foil and the foil is changed regularly during lab clean. This is necessary because the primary photoresist used in this spinner is SU-8, which is not soluble in most solvents. Chuck vacuum is monitored regularly.